- 专利标题： METHOD FOR CONTROLLING A DISTRIBUTION OF ENERGY INTRODUCED INTO A SUBSTRATE BY A LINE FOCUS OF A LASER BEAM, AND SUBSTRATE
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申请号： US18492036申请日： 2023-10-23
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公开(公告)号： US20240042555A1公开(公告)日： 2024-02-08
- 发明人: Andreas Ortner , David Sohr , Andreas Koglbauer , Jens Ulrich Thomas , Fabian Wagner , Oliver Sohr
- 申请人： SCHOTT AG
- 申请人地址： DE Mainz
- 专利权人： SCHOTT AG
- 当前专利权人： SCHOTT AG
- 当前专利权人地址： DE Mainz
- 优先权： EP 170243.6 2021.04.23 EP 194904.5 2021.09.03
- 主分类号： B23K26/53
- IPC分类号： B23K26/53 ; B23K26/073 ; B23K26/0622 ; B23K26/064 ; B23K26/362 ; C03C23/00
摘要：
A method for controlling an energy distribution introduced by at least one line focus of at least one laser beam in a substrate is performed by forming the line focus at least regionally in the substrate and influencing the laser beam with at least one phase mask to control the energy distribution in the substrate.
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