公开(公告)号：US12037279B2

公开(公告)日：2024-07-16

申请号：US18150122

申请日：2023-01-04

Applicant: SCHOTT AG

Inventor： Fabian Wagner ,  Andreas Ortner ,  Albrecht Seidl ,  Frank-Thomas Lentes ,  Jörn Gerban ,  Simon Schmitt

IPC: C03B33/09 ,  B23K26/53 ,  C03B33/02 ,  C03B33/04 ,  B23K103/00

CPC classification number: C03B33/091 ,  B23K26/53 ,  C03B33/0222 ,  C03B33/04 ,  B23K2103/54

Abstract: A method for separating a portion from a sheet glass element having a thickness of at least 2 millimeters along an intended separation line that divides the sheet glass element into the portion and a remaining main part is provided. The method includes producing filamentary damages comprising sub-micrometer hollow channels in a volume of the glass sheet element adjacently aligned along the separation line; and heating and/or cooling the glass sheet element to cause expansion and/or contraction so that the portion detaches from the main part along the separation line. The portion and the remaining main part each remain intact as a whole. The step of producing the filamentary damages includes generating a plasma within the volume with laser pulses of an ultrashort pulse laser; and displacing points of incidence of the laser pulses over a surface of the glass sheet element along the separation line.

公开(公告)号：US11613492B2

公开(公告)日：2023-03-28

申请号：US16688680

申请日：2019-11-19

Applicant: SCHOTT AG

Inventor： Jens Ulrich Thomas ,  Frank-Thomas Lentes ,  Andreas Ortner ,  Jonas Schatz ,  Michael Kluge

IPC: C03B33/02 ,  B23K26/53 ,  B23K103/00

Abstract: A component of glass or glass ceramic having predamages arranged along at least one predetermined dividing line is provided. The dividing line has a row of predamages lying one behind the other. The predamages pass continuously through the glass or the glass ceramic with at least 90% of the predamages being cylindrically symmetrical. The glass or the glass ceramic has a material compaction of at least 1% relative to an actual material density in a radius of 3 μm about a longitudinal axis of respective pre-damaged points. The relative weight loss per pre-damaged point is less than 10% and the component has a thickness of at least 3.5 mm.

公开(公告)号：US20220401953A1

公开(公告)日：2022-12-22

申请号：US17893860

申请日：2022-08-23

Applicant: Schott AG

Inventor： Andreas Ortner ,  Andreas Roters ,  Hauke Esemann ,  Markus Heiss-Chouquet ,  Fabian Wagner ,  Laura Brueckbauer ,  Stephanie Mangold ,  Vanessa Hiller

IPC: B01L3/00 ,  B81C1/00 ,  B23K26/00 ,  B23K26/0622 ,  B23K26/06 ,  B23K26/364 ,  B23K26/382 ,  C03C15/00 ,  B81B1/00

Abstract: A method for producing a cavity in a substrate composed of hard brittle material is provided. A laser beam of an ultrashort pulse laser is directed a side surface of the substrate and is concentrated by a focusing optical unit to form an elongated focus in the substrate. Incident energy of the laser beam produces a filament-shaped flaw in a volume of the substrate. The filament-shaped flaw extends into the volume to a predetermined depth and does not pass through the substrate. To produce the filament-shaped flaw, the ultrashort pulse laser radiates in a pulse or a pulse packet having at least two successive laser pulses. After at least two filament-shaped flaws are introduced, the substrate is exposed to an etching medium which removes material of the substrate and widens the at least two filament-shaped flaws to form filaments. At least two filaments are connected to form a cavity.

公开(公告)号：US20220112123A1

公开(公告)日：2022-04-14

申请号：US17450957

申请日：2021-10-14

Applicant: SCHOTT AG

Inventor： Andreas Ortner ,  Fabian Wagner ,  Markus Heiss-Chouquet ,  Michael Drisch ,  Vanessa Glässer ,  Annika Hörberg ,  Marisa Boles-Rehbogen

IPC: C03C15/00 ,  C09K13/02 ,  C03C3/097

Abstract: A method for processing glass is provide. The method includes the steps of providing a glass element and removing glass material from the glass element by etching with an alkaline etching medium in an organic solvent.

公开(公告)号：US20220073427A1

公开(公告)日：2022-03-10

申请号：US17466688

申请日：2021-09-03

Applicant: SCHOTT AG

Inventor： Andreas Ortner ,  David Sohr ,  Jens Ulrich Thomas

IPC: C03C23/00 ,  C03C15/00

Abstract: A method for preparing and/or carrying out the structuring of a predetermined or predeterminable distinguished surface of a substrate body having a substrate material includes exposing the substrate material in at least one curved effective area to an electromagnetic field which in each of the at least one curved effective area causes a non-linear interaction between the electromagnetic field and the substrate material, and thus at least partially influencing the substrate material arranged in the curved effective area. After the structuring of the distinguished surface the distinguished surface has at least in certain areas at least one first curved progression which is at least partially determined and/or influenced by the curved shape of the at least one curved effective area. The nonlinear interaction causes at least one nonlinear absorption of the electromagnetic field in the substrate material.

公开(公告)号：US20220001496A1

公开(公告)日：2022-01-06

申请号：US17478110

申请日：2021-09-17

Applicant: SCHOTT AG

Inventor： Andreas Ortner ,  Fabian Wagner ,  Albrecht Seidl ,  Frank-Thomas Lentes

IPC: B23K26/53 ,  B23K26/042 ,  B23K26/0622 ,  B23K26/351 ,  B23K26/046 ,  B23K26/08

Abstract: A method for filamentation of a dielectric workpiece has a workpiece with a thickness between 0.5 and 20 mm is provided. The workpiece has boundary surfaces delimiting the workpiece. The thickness of the workpiece varies spatially and/or at least one of the boundary surfaces delimiting the workpiece has at least one curvature with a radius of curvature between 0.1 μm and 10 m. The dielectric workpiece can have a specially formed edge.

公开(公告)号：US20180117708A1

公开(公告)日：2018-05-03

申请号：US15858705

申请日：2017-12-29

Applicant: Schott AG

Inventor： Andreas Ortner ,  Niklas Bisch ,  Fabian Wagner ,  Albrecht Seidl ,  Frank-Thomas Lentes

IPC: B23K26/0622 ,  C03C23/00 ,  B23K26/06

Abstract: A method provides for producing modifications in or on a transparent workpiece using a laser processing device. The laser processing device has a short pulse or ultrashort pulse laser that emits laser radiation having a wavelength in the transparency range of the workpiece and which has a beam-shaping optical unit for beam shaping for focusing the laser radiation. The transparent workpiece is composed of a material that has a plurality of phases, of which at least two phases have different dielectric constants, of which in turn the one phase is a phase embedded in the form of particles, which phase is substantially surrounded by the other phase, and wherein the product of the volume of the particles specified in cubic nanometers and the ratio of the absolute value of the difference of the two different dielectric constants to the dielectric constant of the surrounding phase is greater than 500.

公开(公告)号：US12297137B2

公开(公告)日：2025-05-13

申请号：US17375268

申请日：2021-07-14

Applicant: Schott AG

Inventor： Andreas Ortner ,  Andreas Roters ,  Frank-Thomas Lentes ,  Lutz Parthier ,  Markus Heiss-Chouquet ,  Ulrich Peuchert ,  Fabian Wagner ,  Florian Resch ,  Laura Brückbauer ,  Matthias Jotz ,  Vanessa Glaßer

IPC: C03B33/02 ,  B23K26/0622 ,  B23K103/00 ,  C03B33/023 ,  C03B33/04 ,  C03B33/06 ,  C03B33/07 ,  C03B33/08 ,  C03C15/00 ,  C03C23/00

Abstract: A method includes: providing a plate-like glass element having side faces and an ultrashort pulse laser having a laser beam; directing the laser beam onto one of the side faces; concentrating the laser beam by focusing optics to form an elongated focus in the glass element; producing a filament-shaped flaw in a volume of the glass element by a radiated-in energy of the laser beam, a longitudinal direction of which runs transverse to one of the side faces, and the ultrashort pulse laser radiates in a pulse or a pulse packet having at least two successive laser pulses to produce the filament-shaped flaw; widening the filament-shaped flaw to form a channel by exposing the glass element to an etching including an etching medium which removes glass at a rate of less than 8 μm per hour; and introducing rounded, hemispherical depressions in a wall of the channel by the etching.

公开(公告)号：US20250070528A1

公开(公告)日：2025-02-27

申请号：US18726213

申请日：2022-12-09

Applicant: Schott AG

Inventor： Andreas Ortner ,  Fabian Wagner ,  Martin Blezinger ,  Ulrich Peuchert ,  Tilmann Götze

IPC: H01S5/02255 ,  H01S5/02208 ,  H01S5/02218 ,  H01S5/02326

Abstract: The invention relates to an encapsulated optoelectronic component having a housing and at least one optoelectronic component, which is arranged in a cavity which is formed by a main element and is covered on an upper side by a cover element, and therefore the optoelectronic component is arranged between the cover element and the main elements and the main element forms side walls which laterally enclose the cavity. A one-part plate element with at least one tongue-shaped deflecting element is arranged between the cover element and the main element in such a way that, in the cavity, the deflecting element is arranged with at least one optical surface by which electromagnetic radiation emitted or received by the optoelectronic component can be deflected. The invention also relates to at least one wafer with deflecting elements, to a composite assembly of encapsulated optoelectronic components and to a method for the production thereof.

公开(公告)号：US12220762B2

公开(公告)日：2025-02-11

申请号：US16687231

申请日：2019-11-18

Applicant: SCHOTT AG

Inventor： Andreas Ortner ,  Fabian Wagner ,  Albrecht Seidl ,  Simon Schmitt ,  Frank-Thomas Lentes ,  Jens Ulrich Thomas

IPC: B23K26/06 ,  B23K26/00 ,  B23K26/046 ,  B23K26/0622 ,  B23K26/064 ,  B23K26/066 ,  B23K26/08 ,  B23K26/53 ,  B23K101/40 ,  B23K103/00 ,  C03B33/02

Abstract: Devices and methods for processing a workpiece along a predetermined processing line are provided. The device includes: a pulsed, polychromatic laser beam generator; an optical arrangement; and a moving device. The laser beam generator generates a laser beam along a beam direction. The optical arrangement generates a focal line along the beam direction. The optical arrangement has a chromatic aberration for wavelength-dependent focusing of the laser beam and a filter for wavelength-dependent filtering of the laser beam. The moving device generates relative movement between the laser beam and the workpiece along the predetermined processing line.