Invention Publication
- Patent Title: LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD
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Application No.: US18231378Application Date: 2023-08-08
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Publication No.: US20240047244A1Publication Date: 2024-02-08
- Inventor: Koki YOSHIMURA , Hayato HOSAKA
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Priority: JP 22126575 2022.08.08
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/02 ; H01L21/687

Abstract:
A liquid processing apparatus provided with a plurality of processors, wherein each of the processors includes a stage on which a substrate is placed, a cup surrounding the stage and the substrate placed thereon, a first processing nozzle and a second processing nozzle configured to supply a first and second processing liquid to the substrate, respectively, a first standby portion where the first processing nozzle stands by, a second standby portion where the second processing nozzle stands by, a first mover configured to move the first processing nozzle between the first standby portion and a first processing position, a second mover configured to move the second processing nozzle between the second standby portion and a second processing position, and a guide shared by the first mover and the second mover such that each of the first mover and the second mover moves in the left-right direction.
Information query
IPC分类: