公开(公告)号：US20240047237A1

公开(公告)日：2024-02-08

申请号：US18228905

申请日：2023-08-01

Applicant: TOKYO ELECTRON LIMITED

Inventor： Koki YOSHIMURA ,  Satoshi NAKAKIDO

IPC: H01L21/67 ,  H01L21/687

CPC classification number: H01L21/67051 ,  H01L21/68764 ,  H01L21/6715

Abstract: A liquid processing apparatus includes: a stage; a cup that surrounds a substrate placed on the stage; a processing liquid supplier that supplies a processing liquid to the substrate; an exhaust port provided in the cup to exhaust the cup; an annular body provided inside the cup to surround the substrate and form a flow path for a gas flowing into the cup; a lifting mechanism that raises or lowers the annular body relative to the cup to perform a switching between a first state in which the annular body is located at a first relative height to perform a first exhaust and a second state in which the annular body is located at a second relative height to perform a second exhaust; and a drainage port that opens to an upstream side of the exhaust port in each of the first and second flow paths.

公开(公告)号：US20140071411A1

公开(公告)日：2014-03-13

申请号：US14022434

申请日：2013-09-10

Applicant: Tokyo Electron Limited

Inventor： Yasushi TAKIGUCHI ,  Taro YAMAMOTO ,  Yoshinori IKEDA ,  Koki YOSHIMURA ,  Yoshiki OKAMOTO ,  Masahiro FUKUDA

IPC: G03F7/30

CPC classification number: G03F7/16 ,  G03F7/3021 ,  G03F7/3092 ,  H01L21/67017

Abstract: The present invention is a developing treatment apparatus for performing development by supplying a developing solution to a substrate having a front surface coated with a positive resist or a negative resist and then subjected to exposure wherein a movable cup is raised to introduce one of scattering developing solutions for the positive and negative resists into an inner peripheral flow path of a cup and the movable cup is lowered to introduce the other of scattering developing solutions for the positive and negative resists into an outer peripheral flow path of the cup, and the developing solution introduced into the inner peripheral flow path and the developing solution introduced into the outer peripheral flow path are separately drained.

Abstract translation: 本发明是一种显影处理装置，用于通过向具有正性抗蚀剂或负性抗蚀剂的前表面的基材供给显影液进行显影，然后进行曝光，其中可移动杯被升高以引入散射显影溶液之一 用于正面和负面的抗蚀剂进入杯子的内周流动路径，并且可移动杯子被降低以将用于正面和负面抗蚀剂的另一个散射显影溶液引入到杯子的外周流动路径中，并且显影溶液引入 进入内周流路，引入外周流路的显影液分别排出。

公开(公告)号：US20240047244A1

公开(公告)日：2024-02-08

申请号：US18231378

申请日：2023-08-08

Applicant: Tokyo Electron Limited

Inventor： Koki YOSHIMURA ,  Hayato HOSAKA

IPC: H01L21/67 ,  H01L21/02 ,  H01L21/687

CPC classification number: H01L21/6715 ,  H01L21/67051 ,  H01L21/02052 ,  H01L21/68764

Abstract: A liquid processing apparatus provided with a plurality of processors, wherein each of the processors includes a stage on which a substrate is placed, a cup surrounding the stage and the substrate placed thereon, a first processing nozzle and a second processing nozzle configured to supply a first and second processing liquid to the substrate, respectively, a first standby portion where the first processing nozzle stands by, a second standby portion where the second processing nozzle stands by, a first mover configured to move the first processing nozzle between the first standby portion and a first processing position, a second mover configured to move the second processing nozzle between the second standby portion and a second processing position, and a guide shared by the first mover and the second mover such that each of the first mover and the second mover moves in the left-right direction.

公开(公告)号：US20180308719A1

公开(公告)日：2018-10-25

申请号：US16014308

申请日：2018-06-21

Applicant: TOKYO ELECTRON LIMITED

Inventor： Yasushi TAKIGUCHI ,  Koki YOSHIMURA ,  Taro YAMAMOTO ,  Hideharu KYOUDA ,  Koshi MUTA

IPC: H01L21/67

CPC classification number: H01L21/67051 ,  H01L21/6715

Abstract: A liquid processing apparatus for performing liquid processing with respect to a substrate using processing fluid, includes: a plurality of substrate holding units arranged side by side in a left-right direction; a nozzle configured to supply the processing fluid to the substrate held in each of the substrate holding units; and a nozzle moving mechanism configured to move the nozzle forward and backward in a front-rear direction intersecting an arrangement direction of the substrate holding units between a supplying position in which the processing fluid is supplied to a region including a central portion of the substrate and a waiting position which is defined at a rear side of a row of the substrate holding units opposite to a front side of the row of the substrate holding units at which the substrate is loaded and unloaded.

公开(公告)号：US20160202609A1

公开(公告)日：2016-07-14

申请号：US15051780

申请日：2016-02-24

Applicant: Tokyo Electron Limited

Inventor： Yasushi TAKIGUCHI ,  Taro YAMAMOTO ,  Yoshinori IKEDA ,  Koki YOSHIMURA ,  Yoshiki OKAMOTO ,  Masahiro FUKUDA

IPC: G03F7/16

CPC classification number: G03F7/16 ,  G03F7/3021 ,  G03F7/3092 ,  H01L21/67017

Abstract: The present invention is a developing treatment apparatus for performing development by supplying a developing solution to a substrate having a front surface coated with a positive resist or a negative resist and then subjected to exposure wherein a movable cup is raised to introduce one of scattering developing solutions for the positive and negative resists into an inner peripheral flow path of a cup and the movable cup is lowered to introduce the other of scattering developing solutions for the positive and negative resists into an outer peripheral flow path of the cup, and the developing solution introduced into the inner peripheral flow path and the developing solution introduced into the outer peripheral flow path are separately drained.

Abstract translation: 本发明是一种显影处理装置，用于通过向具有正性抗蚀剂或负性抗蚀剂的前表面的基材供给显影液进行显影，然后进行曝光，其中可移动杯被升高以引入散射显影溶液之一 用于正面和负面的抗蚀剂进入杯子的内周流动路径，并且可移动杯子被降低以将用于正面和负面抗蚀剂的另一个散射显影溶液引入到杯子的外周流动路径中，并且显影溶液引入 进入内周流路，引入外周流路的显影液分别排出。

公开(公告)号：US20150027503A1

公开(公告)日：2015-01-29

申请号：US14339539

申请日：2014-07-24

Applicant: TOKYO ELECTRON LIMITED

Inventor： Yasushi TAKIGUCHI ,  Koki YOSHIMURA ,  Taro YAMAMOTO ,  Hideharu KYOUDA ,  Koshi MUTA

IPC: H01L21/67

CPC classification number: H01L21/67051 ,  H01L21/6715

Abstract: A liquid processing apparatus for performing liquid processing with respect to a substrate using processing fluid, includes: a plurality of substrate holding units arranged side by side in a left-right direction; a nozzle configured to supply the processing fluid to the substrate held in each of the substrate holding units; and a nozzle moving mechanism configured to move the nozzle forward and backward in a front-rear direction intersecting an arrangement direction of the substrate holding units between a supplying position in which the processing fluid is supplied to a region including a central portion of the substrate and a waiting position which is defined at a rear side of a row of the substrate holding units opposite to a front side of the row of the substrate holding units at which the substrate is loaded and unloaded.

Abstract translation: 一种用于使用处理流体对基板进行液体处理的液体处理装置，包括：沿左右方向并排布置的多个基板保持单元; 喷嘴，被构造成将处理流体供应到保持在每个基板保持单元中的基板; 以及喷嘴移动机构，其构造成使喷嘴在与将基板保持单元的排列方向相交的前后方向向前后方向移动，所述喷嘴移动机构在供给位置和供给位置之间，所述供给位置将所述处理流体供给至包含所述基板的中央部的区域， 限定在与衬底保持单元的行的前侧相对的衬底保持单元的行的后侧处的基准装载和卸载的等待位置。