Invention Publication
- Patent Title: LASER PROCESSING DEVICE AND LASER PROCESSING METHOD
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Application No.: US18266842Application Date: 2021-12-20
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Publication No.: US20240051067A1Publication Date: 2024-02-15
- Inventor: Yo SUGIMOTO , Takeshi SAKAMOTO , Takafumi OGIWARA , Naoki UCHIYAMA , Takashi KURITA , Ryo YOSHIMURA
- Applicant: HAMAMATSU PHOTONICS K.K.
- Applicant Address: JP Hamamatsu-shi, Shizuoka
- Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee Address: JP Hamamatsu-shi, Shizuoka
- Priority: JP 20217212 2020.12.25
- International Application: PCT/JP2021/047081 2021.12.20
- Date entered country: 2023-06-13
- Main IPC: B23K26/351
- IPC: B23K26/351 ; B23K26/064 ; B23K26/04

Abstract:
A laser processing method includes: a first step of preparing a wafer including a plurality of functional elements disposed to be adjacent to each other via a street; and a second step of, after the first step, irradiating the street with laser light based on information regarding the street such that a surface layer of the street is removed in a first region of the street and the surface layer remains in a second region of the street. The information regarding the street includes information indicating that, when a modified region is formed in the wafer along a line passing through the street, a fracture extending from the modified region does not reach the street along the line in the first region, and reaches the street along the line in the second region.
Information query