- 专利标题: SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
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申请号: US18502109申请日: 2023-11-06
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公开(公告)号: US20240074328A1公开(公告)日: 2024-02-29
- 发明人: Hui-Lin Wang , Chen-Yi Weng , Yi-Wei Tseng , Chin-Yang Hsieh , Jing-Yin Jhang , Yi-Hui Lee , Ying-Cheng Liu , Yi-An Shih , I-Ming Tseng , Yu-Ping Wang
- 申请人: United Microelectronics Corp.
- 申请人地址: TW Hsin-Chu City
- 专利权人: United Microelectronics Corp.
- 当前专利权人: United Microelectronics Corp.
- 当前专利权人地址: TW Hsin-Chu City
- 优先权: CN 1910418706.2 2019.05.20
- 主分类号: H10N50/80
- IPC分类号: H10N50/80 ; G11C5/06 ; G11C11/16 ; H01L29/82 ; H10N50/01 ; H10N50/10
摘要:
A semiconductor device includes a magnetic tunneling junction (MTJ) on a substrate, a first spacer on one side of the of the MTJ, a second spacer on another side of the MTJ, a first metal interconnection on the MTJ, and a liner adjacent to the first spacer, the second spacer, and the first metal interconnection. Preferably, each of a top surface of the MTJ and a bottom surface of the first metal interconnection includes a planar surface and two sidewalls of the first metal interconnection are aligned with two sidewalls of the MTJ.
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