- 专利标题： SELF-ALIGNED PATTERNED PROJECTION LINER FOR SIDEWALL ELECTRODE PCM
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申请号： US17894549申请日： 2022-08-24
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公开(公告)号： US20240074336A1公开(公告)日： 2024-02-29
- 发明人: Injo Ok , Timothy Mathew Philip , Jin Ping Han , Ching-Tzu Chen , Kevin W. Brew , Lili Cheng
- 申请人： International Business Machines Corporation
- 申请人地址： US NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： US NY Armonk
- 主分类号： H01L45/00
- IPC分类号： H01L45/00
摘要：
A memory device and method of forming a projection liner under a mushroom phase change memory device with sidewall electrode process scheme to provide self-aligned patterning of resistive projection liner during sidewall electrode formation.
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