Invention Publication
- Patent Title: TARGET PROCESSING DEVICE AND TARGET PROCESSING METHOD
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Application No.: US18164053Application Date: 2023-02-03
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Publication No.: US20240096601A1Publication Date: 2024-03-21
- Inventor: Takeharu MOTOKAWA , Noriko SAKURAI , Hideaki SAKURAI
- Applicant: Kioxia Corporation
- Applicant Address: JP Tokyo
- Assignee: Kioxia Corporation
- Current Assignee: Kioxia Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP 22148547 2022.09.16
- Main IPC: H01J37/32
- IPC: H01J37/32 ; C01B32/05 ; G03F1/58 ; G03F1/80

Abstract:
A target processing method includes: importing a target into a processing chamber; forming a film including carbon on the target using at least one of first ion including carbon and a first plasma including carbon; and removing the film by a reaction between a second plasma and the film, wherein the forming of the film and the removing of the film are alternately performed a number of times in the processing chamber without removing the target from the processing chamber.
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