公开(公告)号：US20250013146A1

公开(公告)日：2025-01-09

申请号：US18890006

申请日：2024-09-19

Applicant: Kioxia Corporation

Inventor： Takeharu MOTOKAWA ,  Noriko SAKURAI ,  Hideaki SAKURAI

IPC: G03F7/00 ,  B82Y40/00

Abstract: A template according to an embodiment includes a substrate and a first layer. The substrate includes a first face having a pattern, and contains a first element. The first layer is in contact with the first face, and contains a compound having the first element and a second element different from the first element, the density of the compound in the first layer being higher than the density of the compound in the substrate.

公开(公告)号：US20230307233A1

公开(公告)日：2023-09-28

申请号：US17930637

申请日：2022-09-08

Applicant: Kioxia Corporation

Inventor： Noriko SAKURAI ,  Takeharu MOTOKAWA ,  Hideaki SAKURAI

IPC: H01L21/033 ,  H01L21/3065 ,  H01L21/67

CPC classification number: H01L21/0332 ,  H01L21/3065 ,  H01L21/0337 ,  H01L21/67063

Abstract: An example of an etching method according to the present disclosure, includes: performing a first process which includes forming a first layer containing halogen or holding the substrate in a gas atmosphere containing halogen; and performing a second process which includes removing a portion of the first layer and a portion of the substrate under the portion of the first layer by supplying the portion of the first layer with ions sourced from a solid material.

公开(公告)号：US20230260780A1

公开(公告)日：2023-08-17

申请号：US18296816

申请日：2023-04-06

Applicant: Kioxia Corporation

Inventor： Minako INUKAI ,  Hideaki SAKURAI ,  Kyo OTSUBO ,  Tetsuo TAKEMOTO

IPC: H01L21/02 ,  B08B3/04 ,  B08B3/08 ,  B08B3/12 ,  B08B7/00 ,  H01L21/67 ,  H01L21/66

CPC classification number: H01L21/02101 ,  B08B3/08 ,  B08B3/041 ,  B08B3/123 ,  B08B7/0014 ,  H01L21/67051 ,  H01L21/67248 ,  H01L22/12 ,  H01L21/02082

Abstract: According to one embodiment, a method including supplying a liquid onto a substrate, solidifying the liquid on the substrate to form a solidified body, and melting the solidified body of the liquid on the substrate is provided. When solidifying the liquid, an internal pressure of the liquid on the substrate is varied.

公开(公告)号：US20230296979A1

公开(公告)日：2023-09-21

申请号：US17842615

申请日：2022-06-16

Applicant: Kioxia Corporation

Inventor： Takeharu MOTOKAWA ,  Noriko SAKURAI ,  Hideaki SAKURAI

IPC: G03F7/00 ,  H01L21/3105

CPC classification number: G03F7/0002 ,  H01L21/31058

Abstract: A template according to the present embodiment includes a substrate, a light transmissive film, and a plurality of convex parts. The substrate has a first surface. The light transmissive film is provided on the first surface, has a second surface on a side opposite to the substrate, and has a composition different from the composition of the substrate. The plurality of convex parts are provided on the second surface and have different heights.

公开(公告)号：US20240096601A1

公开(公告)日：2024-03-21

申请号：US18164053

申请日：2023-02-03

Applicant: Kioxia Corporation

Inventor： Takeharu MOTOKAWA ,  Noriko SAKURAI ,  Hideaki SAKURAI

IPC: H01J37/32 ,  C01B32/05 ,  G03F1/58 ,  G03F1/80

CPC classification number: H01J37/32412 ,  C01B32/05 ,  G03F1/58 ,  G03F1/80 ,  H01J37/32055 ,  H01J37/32357 ,  H01J37/32449 ,  H01J37/32743 ,  C01P2002/02 ,  H01J37/32669 ,  H01J2237/20235 ,  H01J2237/20278 ,  H01J2237/24578 ,  H01J2237/332 ,  H01J2237/334 ,  H01J2237/3365

Abstract: A target processing method includes: importing a target into a processing chamber; forming a film including carbon on the target using at least one of first ion including carbon and a first plasma including carbon; and removing the film by a reaction between a second plasma and the film, wherein the forming of the film and the removing of the film are alternately performed a number of times in the processing chamber without removing the target from the processing chamber.

公开(公告)号：US20210238739A1

公开(公告)日：2021-08-05

申请号：US17009388

申请日：2020-09-01

Applicant: KIOXIA CORPORATION

Inventor： Ryu KOMATSU ,  Takeharu MOTOKAWA ,  Noriko SAKURAI ,  Hideaki SAKURAI

IPC: C23C16/44 ,  H01J37/32 ,  C23C16/50 ,  G03F7/00

Abstract: According to one embodiment, a processing apparatus includes a chamber, a first gas introduction port that introduces a first gas into the chamber, a first gas discharge port that discharges the first gas from the chamber, and a stage that supports a processing object in the chamber. The processing apparatus has a plasma generating section with an electrode to generate a plasma in the chamber. The processing apparatus includes a shield at a first position that is between the plasma generating section and the stage. The shield is light transmissive, but blocks radicals and ions generated with plasma. In some examples, the shield may be moveable from the first position to another position that is not between the plasma generating section and the stage.

公开(公告)号：US20220291581A1

公开(公告)日：2022-09-15

申请号：US17447044

申请日：2021-09-07

Applicant: Kioxia Corporation

Inventor： Takeharu MOTOKAWA ,  Noriko SAKURAI ,  Hideaki SAKURAI

IPC: G03F7/00

Abstract: A template according to an embodiment includes a substrate and a first layer. The substrate includes a first face having a pattern, and contains a first element. The first layer is in contact with the first face, and contains a compound having the first element and a second element different from the first element, the density of the compound in the first layer being higher than the density of the compound in the substrate.

公开(公告)号：US20220206382A1

公开(公告)日：2022-06-30

申请号：US17463435

申请日：2021-08-31

Applicant: KIOXIA CORPORATION

Inventor： Noriko SAKURAI ,  Takeharu MOTOKAWA ,  Ryu KOMATSU ,  Hideaki SAKURAI

IPC: G03F7/00 ,  G03F1/50 ,  G03F1/80

Abstract: According to one embodiment, a pattern formation method includes patterning a first film on a substate to have a plurality of lines extending in a first direction and a second pattern portion extending in a second direction intersecting the first direction. Each line having at least a first width and being spaced from an adjacent line in the second direction by a least three times the first width and spaced from ends of the lines in the first direction by twice or less the first width. A conformal film is then formed on the patterned first film. The conformal film having a thickness equal to the first width. The patterned first film is then removed while leaving portions of the conformal film that were previously on sidewalls of the plurality of lines behind.

公开(公告)号：US20210291408A1

公开(公告)日：2021-09-23

申请号：US17115955

申请日：2020-12-09

Applicant: Kioxia Corporation

Inventor： Takeharu MOTOKAWA ,  Hideaki SAKURAI ,  Noriko SAKURAI ,  Ryu KOMATSU

IPC: B29C33/38 ,  G03F7/00

Abstract: A method of manufacturing a template, has: preparing a substrate containing quartz and having a surface, the surface including a protrusion and a depression; and processing the depression. The processing of the depression includes: a first step of forming a film on the surface, the film including a first region and a second region, the first region being provided on the protrusion, and the second region being provided on a bottom of the depression and being thinner than the first region; a second step of removing the second region with the first region partly remaining to expose the bottom of the depression; and a third step of processing the exposed part of the depression using a mask made of the remainder of the first region.

公开(公告)号：US20210088906A1

公开(公告)日：2021-03-25

申请号：US16817804

申请日：2020-03-13

Applicant: Kioxia Corporation

Inventor： Takeharu MOTOKAWA ,  Noriko SAKURAI ,  Ryu KOMATSU ,  Hideaki SAKURAI

IPC: G03F7/09 ,  G03F7/00 ,  G03F9/00

Abstract: According to one embodiment, a pattern forming method includes forming a resist film including a first core material pattern and a second core material pattern, on a first film laminated on a substrate; forming a second film at least on sidewalls of the first and second core material patterns; removing the first core material pattern while not removing the second core material pattern and the second film; and processing the first film by using, as a mask, the second core material pattern and the second film.