Invention Publication
- Patent Title: CHAMBER ARRANGEMENTS WITH LASER SOURCES, SEMICONDUCTOR PROCESSING SYSTEMS, AND MATERIAL LAYER DEPOSITION METHODS
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Application No.: US18476117Application Date: 2023-09-27
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Publication No.: US20240112930A1Publication Date: 2024-04-04
- Inventor: Fan Gao , Peipei Gao , Wentao Wang , Kai Zhou , Kishor Patil , Han Ye , Xing Lin , Alexandros Demos
- Applicant: ASM IP Holding, B.V.
- Applicant Address: NL Almere
- Assignee: ASM IP Holding, B.V.
- Current Assignee: ASM IP Holding, B.V.
- Current Assignee Address: NL Almere
- Main IPC: H01L21/67
- IPC: H01L21/67 ; B23K26/03 ; B23K26/06 ; C23C16/458 ; C23C16/46 ; C23C16/48 ; C23C16/52 ; G05D23/19
Abstract:
A chamber arrangement includes a chamber body, a substrate support, and a laser source. The substrate support is arranged within the chamber body and supported for rotation about a rotation axis relative to the chamber body. The laser source is arranged outside of the chamber body and optically coupled to the substrate support along a lasing axis. The lasing axis intersects the substrate support at a location radially outward from an outer periphery of a substrate seated on the substrate support. A semiconductor processing system and a material layer deposition method are also described.
Information query
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