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公开(公告)号:US20240112930A1
公开(公告)日:2024-04-04
申请号:US18476117
申请日:2023-09-27
Applicant: ASM IP Holding, B.V.
Inventor: Fan Gao , Peipei Gao , Wentao Wang , Kai Zhou , Kishor Patil , Han Ye , Xing Lin , Alexandros Demos
CPC classification number: H01L21/67115 , B23K26/034 , B23K26/0626 , B23K26/0643 , C23C16/4584 , C23C16/46 , C23C16/483 , C23C16/52 , G05D23/1931 , H01L21/67109
Abstract: A chamber arrangement includes a chamber body, a substrate support, and a laser source. The substrate support is arranged within the chamber body and supported for rotation about a rotation axis relative to the chamber body. The laser source is arranged outside of the chamber body and optically coupled to the substrate support along a lasing axis. The lasing axis intersects the substrate support at a location radially outward from an outer periphery of a substrate seated on the substrate support. A semiconductor processing system and a material layer deposition method are also described.
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公开(公告)号:US20240071805A1
公开(公告)日:2024-02-29
申请号:US18238577
申请日:2023-08-28
Applicant: ASM IP Holding B.V.
Inventor: Han Ye , Peipei Gao , Wentao Wang , Aniket Chitale , Xing Lin , Alexandros Demos , Yanfu Lu
IPC: H01L21/687 , H01L21/67
CPC classification number: H01L21/68735 , H01L21/67069
Abstract: Methods, systems, and assemblies suitable for gas-phase processes are disclosed. An exemplary assembly includes a susceptor ring and at least one injector tube. The injector tube can be disposed within the susceptor ring to provide a gas to a lower chamber area of a reactor. Methods, systems, and assemblies can be used to obtain desired etching and purging of the lower chamber area.
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公开(公告)号:US20250038039A1
公开(公告)日:2025-01-30
申请号:US18785702
申请日:2024-07-26
Applicant: ASM IP Holding B.V.
Inventor: Ion Hong Chao , Kai Zhou , Peipei Gao , Wentao Wang , Han Ye , Kishor Patil , Fan Gao , Xing Lin , Alexandros Demos
IPC: H01L21/687
Abstract: A lift pin includes a lift pin body arranged along a lift pin axis having a contact pad, a stem segment, a neck segment, and a span feature. The contact pad is defined at a first end of the lift pin body, the stem segment extends from the contact pad, and the neck segment extends from the stem segment. The span feature is defined at a second end of the lift pin body, is connected to the contact pad by the neck segment and the stem segment, and has a minor and major widths. The minor width is equivalent to a neck diameter defined by the neck segment, the major with is greater than the minor width, and the major width is greater than a stem diameter defined by the stem segment. Lift pin arrangements, semiconductor processing systems, and methods of making semiconductor processing systems are also described.
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公开(公告)号:US20240071804A1
公开(公告)日:2024-02-29
申请号:US18238573
申请日:2023-08-28
Applicant: ASM IP Holding B.V.
Inventor: Peipei Gao , Wentao Wang , Han Ye , Kai Zhou , Fan Gao , Xing Lin
IPC: H01L21/687 , H01L21/02 , H01L21/67
CPC classification number: H01L21/68735 , H01L21/0262 , H01L21/67017 , H01L21/67248
Abstract: Methods, systems, and assemblies suitable for gas-phase processes are disclosed. An exemplary assembly includes a susceptor ring and at least one injector tube. The injector tube can be disposed within the susceptor ring to provide a gas to a peripheral region of a substrate. Methods, systems, and assemblies can be used to obtain desired (e.g. composition and/or thickness) profiles of material on a substrate surface.
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公开(公告)号:US20220301905A1
公开(公告)日:2022-09-22
申请号:US17697145
申请日:2022-03-17
Applicant: ASM IP Holding B.V.
Inventor: Han Ye , Kai Zhou , Peipei Gao , Wentao Wang , Kishor Patil , Fan Gao , Krishnaswamy Mahadevan , Xing Lin , Alexandros Demos
Abstract: A method of operating a reactor system to provide multi-zone substrate temperature control. The method includes, with a first pyrometer, sensing a temperature of a first zone of a substrate supported in the reactor system, and, with a second pyrometer, sensing a temperature of a second zone of the substrate. The method further includes, with a controller, comparing the temperatures of the first and second zones to setpoint temperatures for the first and second zones and, in response, generating control signals to control heating of the substrate. The method also includes controlling, based on the control signals, operations of a heater assembly operating to heat the substrate.
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公开(公告)号:US20220181193A1
公开(公告)日:2022-06-09
申请号:US17457605
申请日:2021-12-03
Applicant: ASM IP HOLDING B.V.
Inventor: Peipei Gao , Wentao Wang , Xing Lin , Han Ye , Ion Hong Chao , Siyao Luan , Alexandros Demos , Fan Gao
IPC: H01L21/687
Abstract: A substrate support and lift assembly configured to support and lift a substrate from a susceptor is disclosed. The substrate support and lift assembly can include a susceptor support and a lift pin. The susceptor support can be configured to support the susceptor thereon. The susceptor support includes a plurality of support arms each extending radially from a central portion of the susceptor support to a terminus. Each of the plurality of support arms includes an aperture extending therethrough. The lift pin can be configured to fit through the aperture of a corresponding support arm to lift a substrate on the susceptor.
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公开(公告)号:US20240222187A1
公开(公告)日:2024-07-04
申请号:US18397372
申请日:2023-12-27
Applicant: ASM IP Holding B.V.
Inventor: Aniket Chitale , Felix Rabinovich , Gary Urban Keppers , Han Ye , Bradley Wayne Evans , Wentao Wang , Gregory Rosendahl , Amin Azimi
IPC: H01L21/687 , C23C16/44 , C23C16/458
CPC classification number: H01L21/68792 , C23C16/4412 , C23C16/4581 , H01L21/68785
Abstract: A shaft member includes a cylindrical body formed from a ceramic material and having a drive segment, a frustoconical segment, and an end key segment. The drive segment extends about a rotation axis, the frustoconical segment is offset from the drive segment along the rotation axis, and the end key segment extends axially from the frustoconical segment and is axially separated from the drive segment by the frustoconical segment of the shaft member. The end key segment has a first circumferential facet and a second circumferential facet circumferentially opposite the first circumferential facet to fix the shaft member in rotation about the rotation axis relative to a support member seated when the end key segment is slidably received within an end key socket defined within the support member. Process kits, semiconductor processing systems, and methods of making semiconductor processing systems are also described.
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公开(公告)号:USD1031676S1
公开(公告)日:2024-06-18
申请号:US29760951
申请日:2020-12-04
Applicant: ASM IP HOLDING B.V.
Designer: Peipei Gao , Wentao Wang , Xing Lin , Han Ye , Ion Hong Chao , Siyao Luan , Alexandros Demos , Fan Gao
Abstract: FIG. 1 is a front perspective view of a combined susceptor, support, and lift system;
FIG. 2 is a back perspective view thereof;
FIG. 3 is a side view thereof;
FIG. 4 is a cross-sectional view taken along line 4-4 as indicated in FIG. 3;
FIG. 5 is an enlarged view of FIG. 4 shown without broken line environmental subject matter for clarity of the claimed subject matter;
FIG. 6 is a top perspective view of the lift pin thereof;
FIG. 7 is a bottom perspective view of the lift pin thereof;
FIG. 8 is a front view of the lift pin thereof;
FIG. 9 is a back view of the lift pin thereof;
FIG. 10 is a left view of the lift pin thereof;
FIG. 11 is a right view of the lift pin thereof;
FIG. 12 is a top view of the lift pin thereof; and,
FIG. 13 is a bottom view of the lift pin thereof.
The dash-dash broken lines within the shaded area and the dash-dash broken lines in FIGS. 1-13 depicting various components of the susceptor, support, and lift system are for the purpose of illustrating environmental subject matter and portions of the article that form no part of the claimed design. The dot-dash broken line in FIG. 3 is for the purpose of defining the cross-sectional view shown in FIG. 4.
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