Invention Publication
- Patent Title: COATING FILM FORMATION METHOD
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Application No.: US18269082Application Date: 2021-11-11
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Publication No.: US20240116076A1Publication Date: 2024-04-11
- Inventor: Takaomi TANABE , Seiichiro KAWACHI , Kosaku HIYAMA
- Applicant: TOCALO CO.,LTD.
- Applicant Address: JP Htogo
- Assignee: TOCALO CO.,LTD.
- Current Assignee: TOCALO CO.,LTD.
- Current Assignee Address: JP Hyogo
- Priority: JP 20213363 2020.12.23
- International Application: PCT/JP2021/041604 2021.11.11
- Date entered country: 2023-06-22
- Main IPC: B05D1/38
- IPC: B05D1/38 ; B05D3/02 ; B05D7/00 ; B05D7/14

Abstract:
The method for forming a coating of the present invention includes: a first step of applying a first solution containing a polysilazane to a surface 2a of a metal substrate 2 and heating the first solution to form a first coating 1 on the surface 2a of the metal substrate 2, and a second step of applying a second solution containing a polysilazane to a surface 1a of the first coating 1 and heating the second solution at a temperature lower than a heating temperature in the first step to form a second coating 3 on the surface 1a of the first coating 1, wherein a density of the first coating is less than 2.00 g/cm3, and a density of the second coating is 2.00 g/cm3 or more.
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