COATING FILM FORMATION METHOD
    1.
    发明公开

    公开(公告)号:US20240116076A1

    公开(公告)日:2024-04-11

    申请号:US18269082

    申请日:2021-11-11

    申请人: TOCALO CO.,LTD.

    摘要: The method for forming a coating of the present invention includes: a first step of applying a first solution containing a polysilazane to a surface 2a of a metal substrate 2 and heating the first solution to form a first coating 1 on the surface 2a of the metal substrate 2, and a second step of applying a second solution containing a polysilazane to a surface 1a of the first coating 1 and heating the second solution at a temperature lower than a heating temperature in the first step to form a second coating 3 on the surface 1a of the first coating 1, wherein a density of the first coating is less than 2.00 g/cm3, and a density of the second coating is 2.00 g/cm3 or more.

    COATING FILM FORMATION METHOD
    2.
    发明公开

    公开(公告)号:US20240044009A1

    公开(公告)日:2024-02-08

    申请号:US18269077

    申请日:2021-11-11

    申请人: TOCALO CO.,LTD.

    IPC分类号: C23C22/74 C23C28/04 C23C22/77

    摘要: The method for forming a coating of the present invention includes: a first step of applying a first solution containing a polysilazane to a surface 2a of a metal substrate 2, heating the first solution to make the first solution undergo conversion into silica and form a first coating 1 having open defects 3, on the surface 2a of the metal substrate 2, and a second step of applying a second solution containing a polysilazane to a surface 1a of the first coating 1 to fill the open defects 3, and heating the second solution at a temperature lower than a heating temperature in the first step to make the second solution undergo conversion into silica and form a second coating 5 on a surface 1a of the first coating 1.