The disclosure relates to a system for a surface treatment of a substrate with a liquid, comprising: a first substrate holder, a second substrate holder, a liquid dispensing unit, a treatment chamber, and control unit, wherein the first substrate holder is configured to hold the substrate, wherein the first substrate holder is moveable in the treatment chamber and configured to hand the substrate over to the second substrate holder, wherein the second substrate holder is rotatable and configured to hold the substrate during a rotation of the substrate in and relative to the treatment chamber, wherein the liquid dispensing unit is moveable relative to the second substrate holder and configured to dispense the liquid onto the substrate, and wherein the control unit is configured to control a rotational speed of the substrate, a position of the liquid dispensing unit and/or a dispense rate of the liquid. Further, the disclosure also relates to a method for a surface treatment of a substrate with a liquid, and to a computer program element for a system for a surface treatment of a substrate with a liquid.