公开(公告)号：US20240145231A1

公开(公告)日：2024-05-02

申请号：US18574640

申请日：2022-04-07

Applicant: SEMSYSCO GMBH

Inventor： Georg Hofer ,  Andreas Gleissner

IPC: H01L21/02 ,  B08B3/04 ,  H01L21/67 ,  H01L21/683

CPC classification number: H01L21/02087 ,  B08B3/041 ,  H01L21/67051 ,  H01L21/6838

Abstract: The disclosure relates to a system for a surface treatment of a substrate with a liquid, comprising: a first substrate holder, a second substrate holder, a liquid dispensing unit, a treatment chamber, and control unit, wherein the first substrate holder is configured to hold the substrate, wherein the first substrate holder is moveable in the treatment chamber and configured to hand the substrate over to the second substrate holder, wherein the second substrate holder is rotatable and configured to hold the substrate during a rotation of the substrate in and relative to the treatment chamber, wherein the liquid dispensing unit is moveable relative to the second substrate holder and configured to dispense the liquid onto the substrate, and wherein the control unit is configured to control a rotational speed of the substrate, a position of the liquid dispensing unit and/or a dispense rate of the liquid. Further, the disclosure also relates to a method for a surface treatment of a substrate with a liquid, and to a computer program element for a system for a surface treatment of a substrate with a liquid.

公开(公告)号：US11965263B2

公开(公告)日：2024-04-23

申请号：US17794517

申请日：2020-09-02

Applicant: SEMSYSCO GMBH

Inventor： Herbert Ötzlinger ,  Oliver Knoll ,  Raoul Schröder ,  Markus Gersdorff ,  Thomas Wirnsberger ,  Georg Hofer ,  Andreas Gleissner

IPC: C25D17/06 ,  C25D17/00

CPC classification number: C25D17/06 ,  C25D17/004

Abstract: The invention relates to a substrate holding and locking system for chemical and/or electrolytic surface treatment of a substrate in a process fluid and a corresponding method. The system comprises a first element, a second element, a reduced pressure holding unit and a magnetic locking unit. The first element and the second element are configured to hold the substrate between each other. The reduced pressure holding unit comprises a pump to reduce an interior pressure inside the substrate holding and locking system below atmospheric pressure. The magnetic locking unit is configured to lock the first element and the second element with each other. The magnetic locking unit comprises a magnet control and at least a magnet. The magnet is arranged at one of the first element and the second element. The magnet control is configured to control a magnetic force between the first element and the second element.

公开(公告)号：US20250137161A1

公开(公告)日：2025-05-01

申请号：US18834576

申请日：2022-12-23

Applicant: SEMSYSCO GMBH

Inventor： Andreas Gleissner ,  Georg Hofer

IPC: C25D17/08 ,  C25D17/00

Abstract: The disclosure relates to a substrate holder for holding a substrate in a chemical and/or electrolytic surface treatment of the substrate, a substrate handling system comprising a substrate holder and an immersion scanner unit and a use of a substrate holder for holding a substrate with a width in a range of 1000 to 3500 mm and a length in a range of 1000 to 4000 mm. The substrate holder for holding a substrate in a chemical and/or electrolytic surface treatment of the substrate comprises a substrate carrier and a power contact unit. The substrate carrier comprises a frame to carry the substrate. The power contact unit comprises a body, a plurality of main legs extending from the body at least partially along an edge of the substrate carrier and a plurality of side legs each arranged essentially perpendicular at one of the main legs to contact the substrate. The power contact unit further comprises a plurality of retaining elements provided between the body of the power contact unit and the frame of the substrate carrier to keep the substrate in contact with the power contact unit when the substrate is placed onto the substrate carrier.

公开(公告)号：US20250146165A1

公开(公告)日：2025-05-08

申请号：US18833353

申请日：2022-12-09

Applicant: SEMSYSCO GMBH

Inventor： Andreas Gleissner ,  Georg Hofer ,  Franz Markut

IPC: C25D17/00 ,  C25D21/04 ,  C25D21/10 ,  C25D21/11

Abstract: The disclosure relates to a system for a chemical and/or electrolytic surface treatment of a substrate comprises a catholyte chamber, an anolyte chamber, a distribution body, and a catholyte outlet. The distribution body is arranged in the catholyte chamber and the catholyte chamber is separated from the anolyte chamber by means of a membrane, wherein the membrane is tilted relative to the distribution body. The distribution body comprises jet openings for distributing a catholyte onto the substrate to be treated and drain openings for draining the catholyte out of a reaction space between the distribution body and the substrate. The catholyte outlet is arranged at the catholyte chamber in an eccentric position.

公开(公告)号：US20240141534A1

公开(公告)日：2024-05-02

申请号：US18280784

申请日：2021-12-02

Applicant: SEMSYSCO GMBH

Inventor： Andreas Gleissner ,  Georg Hofer ,  Marianne Kolitsch-MataIn

IPC: C25D5/08 ,  C25D5/04 ,  C25D17/00 ,  C25D21/10

CPC classification number: C25D5/08 ,  C25D5/04 ,  C25D17/001 ,  C25D21/10

Abstract: The disclosure relates to a distribution system for a process fluid for a chemical and/or electrolytic surface treatment of a substrate, comprising: a distribution body, and a substrate holder, wherein the substrate holder has a substrate holder length (L) and a substrate holder width (W) and is configured to hold the substrate to be treated, wherein the distribution body comprises several openings for a process fluid and/or an electric current, wherein the distribution body and the substrate holder are moveable relative to each other, wherein the distribution body has a distribution body length (l) and a distribution body width (w), and wherein the distribution body length (l) is smaller than the substrate holder length (L).