Invention Publication
- Patent Title: Dynamic Phased Array Plasma Source For Complete Plasma Coverage Of A Moving Substrate
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Application No.: US18423636Application Date: 2024-01-26
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Publication No.: US20240162020A1Publication Date: 2024-05-16
- Inventor: Hari Ponnekanti , Mukund Srinivasan
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- The original application number of the division: US15813877 2017.11.15
- Main IPC: H01J37/32
- IPC: H01J37/32 ; C23C16/458 ; C23C16/505 ; C23C16/509 ; C23C16/511 ; C23C16/52

Abstract:
Apparatus and methods to process a substrate comprising a gas distribution assembly comprising a plasma process region with an array of individual plasma sources. A controller is connected to the array of individual plasma sources and the substrate support. The controller is configured monitor the position of the at least one substrate and provide or disable power to the individual plasma sources based on the position of the substrate relative to the individual plasma sources.
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