- 专利标题: PATTERNED LIGHT-BLOCKING ELEMENTS
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申请号: US17989019申请日: 2022-11-17
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公开(公告)号: US20240165910A1公开(公告)日: 2024-05-23
- 发明人: Mridula Nair , Peter G. Bessey
- 申请人: Eastman Kodak Company
- 申请人地址: US NY Rochester
- 专利权人: Eastman Kodak Company
- 当前专利权人: Eastman Kodak Company
- 当前专利权人地址: US NY Rochester
- 主分类号: B32B3/30
- IPC分类号: B32B3/30 ; B32B3/26 ; B32B5/18 ; B32B5/24 ; B32B27/06 ; B32B27/20
摘要:
Patterned light-blocking elements are prepared using a method having operations A′) through F′), or a method having operations A″) through G″). Such methods include providing an ii) embossed and densified foamed opacifying layer on the back side of a i) fabric and a iii) non-foamed function composition on the ii) embossed and densified foamed opacifying layer. Embossing can be carried out using self-embossing or any suitable embossing means including a continuous embossing belt or web or an embossing roller or sleeve. The embossing operation provides a visible relief pattern in the ii) embossed and densified foamed opacifying layer that can be viewed from the face side of the patterned light-blocking element when appropriately backlit as a transmissive display in a darkened environment. Such elements can be used as window treatments as well as decorative fabrics in various environments.
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