Invention Publication
- Patent Title: SEMICONDUCTOR DEVICE INCLUDING INCLINED CHANNEL LAYER AND ELECTRONIC DEVICE INCLUDING THE SEMICONDUCTOR DEVICE
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Application No.: US18347929Application Date: 2023-07-06
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Publication No.: US20240178294A1Publication Date: 2024-05-30
- Inventor: Eunkyu LEE , Keunwook SHIN , Minsu SEOL
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Priority: KR 20220160791 2022.11.25
- Main IPC: H01L29/423
- IPC: H01L29/423 ; H01L29/06 ; H01L29/18 ; H01L29/417 ; H01L29/775 ; H01L29/786

Abstract:
A semiconductor device may include a first electrode and a second electrode on a substrate and arranged perpendicular to a surface of the substrate, a plurality of channel layers between the first electrode and the second electrode, and a gate electrode surrounding the plurality of channel layers. The plurality of channel layers may be inclined with respect to a direction from the first electrode to the second electrode. An electronic device may include the semiconductor device.
Information query
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