Invention Publication
- Patent Title: METHOD FOR MONITORING PERFORMANCE OF ECCENTRICITY CORRECTION UNIT AND SUBSTRATE TREATING APPARATUS FOR PERFORMING METHOD
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Application No.: US18385909Application Date: 2023-11-01
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Publication No.: US20240210166A1Publication Date: 2024-06-27
- Inventor: In Ki JUNG , Jeong Hyup YU , Young Joon HAN , Sung Bum PARK
- Applicant: SEMES CO., LTD.
- Applicant Address: KR cheonan-si
- Assignee: SEMES CO., LTD.
- Current Assignee: SEMES CO., LTD.
- Current Assignee Address: KR cheonan-si
- Priority: KR 20220180061 2022.12.21
- Main IPC: G01B11/24
- IPC: G01B11/24

Abstract:
A method for monitoring performance of an eccentricity correction unit, the method includes a first operation of measuring eccentricity of a substrate mounted on a support unit and storing an amount of eccentricity correction corrected by the eccentricity correction unit such that measured eccentricity of the substrate is within a preset allowable eccentricity value, and a second operation of monitoring, based on the stored amount of eccentricity correction, performance degradation of the eccentricity correction unit.
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