Invention Application
- Patent Title: MAGNETORESISTIVE RANDOM ACCESS MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME
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Application No.: US18216610Application Date: 2023-06-30
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Publication No.: US20240415024A1Publication Date: 2024-12-12
- Inventor: Hui-Lin Wang
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Hsin-Chu City
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Hsin-Chu City
- Priority: TW112121667 20230609
- Main IPC: H10N50/10
- IPC: H10N50/10 ; G11C11/16 ; H10B61/00 ; H10N50/01 ; H10N50/80

Abstract:
A magnetoresistive random access memory device includes a bottom electrode, a spin orbit torque (SOT) layer, a magnetic tunneling junction (MTJ) and a top electrode. The bottom electrode includes a first layer and a second layer connected with the first layer. A material of the first layer includes Tax1Ny1, a material of the second layer includes Tax2Ny2, and the following relationships are satisfied: y2/x2>1, y1/x1≥1, and y2/x2>y1/x1. The SOT layer is disposed on the bottom electrode. The MTJ is disposed on the SOT layer. The top electrode is disposed on the MTJ.
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