Invention Application
- Patent Title: THERMAL CONTROL SYSTEMS, MODELS, AND MANUFACTURING PROCESSES IN LITHOGRAPHY
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Application No.: US18713127Application Date: 2022-11-30
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Publication No.: US20250028298A1Publication Date: 2025-01-23
- Inventor: Duan-Fu Stephen HSU , Gerui LIU , Wenjie JIN , Dezheng SUN
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- International Application: PCT/EP2022/083818 WO 20221130
- Main IPC: G05B19/4093
- IPC: G05B19/4093

Abstract:
Dynamic aberration control in a semiconductor manufacturing process is described. In some embodiments, wavefront data representing a wavefront provided by an optical projection system of a semiconductor processing apparatus may be received. Wavefront drift may be determined based on a comparison of the wavefront data and target wavefront data. Based on the wavefront drift, one or more process parameters may be determined. The one or more process parameters include parameters associated with a thermal device, where the thermal device is configured to provide thermal energy to the optical projection system during operation.
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