公开(公告)号：US20250103855A1

公开(公告)日：2025-03-27

申请号：US18723265

申请日：2022-12-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Wenjie JIN

IPC: G06N3/045 ,  G03F7/00 ,  G06N3/044 ,  G06N3/0464 ,  G06N3/0499 ,  G06N3/092

Abstract: A method of generating control actions for controlling a production system, such as by transmitting the control actions to a control system of the production system. The method includes receiving, by a memory unit, a set of observation data characterizing a current state of the production system; processing, by a first neural network module of the memory unit, an input based on at least part of the observation data to generate encoded observation data; updating, by a second neural network module of the memory unit, history information stored in an internal memory of the second module using an input based on at least part of the observation data; obtaining, based on the encoded observation data and the updated history information, state data; and generating, based on the state data, one or more control actions.

公开(公告)号：US20250028298A1

公开(公告)日：2025-01-23

申请号：US18713127

申请日：2022-11-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Duan-Fu Stephen HSU ,  Gerui LIU ,  Wenjie JIN ,  Dezheng SUN

IPC: G05B19/4093

Abstract: Dynamic aberration control in a semiconductor manufacturing process is described. In some embodiments, wavefront data representing a wavefront provided by an optical projection system of a semiconductor processing apparatus may be received. Wavefront drift may be determined based on a comparison of the wavefront data and target wavefront data. Based on the wavefront drift, one or more process parameters may be determined. The one or more process parameters include parameters associated with a thermal device, where the thermal device is configured to provide thermal energy to the optical projection system during operation.

公开(公告)号：US20230273527A1

公开(公告)日：2023-08-31

申请号：US18016226

申请日：2021-06-17

Applicant: ASML Netherlands B.V.

Inventor： Mauritius Gerardus Elisabeth SCHNEIDERS ,  Koos VAN BERKEL ,  Wenjie JIN

IPC: G03F7/20 ,  G03F7/00 ,  G06F17/12

CPC classification number: G03F7/70266 ,  G03F7/70891 ,  G03F7/70504 ,  G03F7/706 ,  G03F7/706839 ,  G03F7/70508 ,  G06F17/12

Abstract: A method for calculating a spatial map associated with a component, the spatial map indicating spatial variations of thermal expansion parameters in the component, the method comprising: providing or determining a temperature distribution in the component as a function of time; calculating the spatial map associated with the component using the provided or determined temperature distribution in the component and optical measurements of a radiation beam that has interacted directly or indirectly with the component, the optical measurements being time synchronized with the provided or determined temperature distribution in the component.

公开(公告)号：US20220382124A1

公开(公告)日：2022-12-01

申请号：US17769725

申请日：2020-10-07

Applicant: ASML Netherlands B.V.

Inventor： Wenjie JIN ,  Nan LIN ,  Christina Lynn PORTER ,  Petrus Wilhelmus SMORENBURG

IPC: G02F1/35 ,  G02F1/355 ,  G03F7/20

Abstract: Disclosed is an illumination source comprising a gas delivery system comprising a gas nozzle. The gas nozzle comprises an opening in an exit plane of the gas nozzle. The gas delivery system is configured to provide a gas flow from the opening for generating an emitted radiation at an interaction region. The illumination source is configured to receive a pump radiation having a propagation direction and to provide the pump radiation in the gas flow. A geometry shape of the gas nozzle is adapted to shape a profile of the gas flow such that gas density of the gas flow first increases to a maximum value and subsequently falls sharply in a cut-off region along the propagation direction.