Invention Grant
US3669665A Process for making resist stencils from photographic stripping films and for using same 失效
从摄影剥离膜制造耐腐蚀性物质和使用它的方法

  • Patent Title: Process for making resist stencils from photographic stripping films and for using same
  • Patent Title (中): 从摄影剥离膜制造耐腐蚀性物质和使用它的方法
  • Application No.: US3669665D
    Application Date: 1971-02-18
  • Publication No.: US3669665A
    Publication Date: 1972-06-13
  • Inventor: FAIGENBAUM MARK ALASKY DANIEL JWEISEL HAROLD C
  • Applicant: IBM
  • Assignee: Ibm
  • Current Assignee: Ibm
  • Priority: US11631771 1971-02-18
  • Main IPC: G03C1/74
  • IPC: G03C1/74 G03F1/08 G03C5/00
Process for making resist stencils from photographic stripping films and for using same
Abstract:
THE SEPARABLE LAYERS OF A PHOTOGRAPHIC STRIPPING FILM. CONSISTING OF A COMPOSITE OF A LAYER OF SENSITIVE UNEXPOSED EMULSION (E.G. SILVER HALIDE) CARRIED UPON A PERMANENT SUPPORT LAYER (E.G. CELLULOSE NITRATE) AND STRIPPED FROM THE TEMPORARY SUPPORT LAYER AND SMOOTHLY ADHERED TO AN OBJECT SURFACE WITH THE PERMANENT SUPPORT LAYER ADJACENT THE SURFACE. THE EMULSION LAYER SUCCESSIVELY RECEIVES IMAGE-WISE EXPOSURE TO LIGHT IN A FAST EXPOSURE PROCESS, PHOTOGRAPHIC DEVELOPMENT AND RELIEF DEVELOPMENT; THE LAST BY AN ETCH-BLEACH PROCESS. THE UNDERLYING SUPPORT LAYER IS DISSOLVED IMAGE-WISE WITH HIGH-FIDELITY THROUGH THE RELIEF STENCIL IN THE EMULSION LAYER. EXPOSED AREAS OF THE OBJECT SURFACE THEN RECEIVE AQUEOUS BASED PROCESS HANDLING (E.G. ETCHING OR PLATING) THROUGH THE AQUEOUS RESISTANT COMPOSITE MASTER STENCIL FORMED BY THE EMULSION AND SUPPORT LAYERS.
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