发明授权
US4012441A Sulphonic derivatives having the structure of polyoxapolyfluoroalkanes
失效
具有聚氧化多氟烷烃结构的磺酸衍生物
- 专利标题: Sulphonic derivatives having the structure of polyoxapolyfluoroalkanes
- 专利标题(中): 具有聚氧化多氟烷烃结构的磺酸衍生物
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申请号: US579943申请日: 1975-05-22
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公开(公告)号: US4012441A公开(公告)日: 1977-03-15
- 发明人: Enrico Pontoglio , Ezio Strepparola , Giancarlo Bernardi
- 申请人: Enrico Pontoglio , Ezio Strepparola , Giancarlo Bernardi
- 申请人地址: IT Milan
- 专利权人: Montedison Fibre S.p.A.
- 当前专利权人: Montedison Fibre S.p.A.
- 当前专利权人地址: IT Milan
- 优先权: IT23340/74 19740530
- 主分类号: C08G65/00
- IPC分类号: C08G65/00 ; B01F17/42 ; C07C67/00 ; C07C301/00 ; C07C303/22 ; C07C303/32 ; C07C309/08 ; C07C309/09 ; C07C309/10 ; C07C309/25 ; C07C309/42 ; C08F2/00 ; C08F2/26 ; C08F14/00 ; C08F214/26 ; C08G65/32 ; C08G65/334 ; C08G67/00 ; C11D1/12 ; C07C143/08
摘要:
Disclosed are alkali and ammonium polyoxapolyfluoroalkanesulphonates having the formula:A-[CF.sub.2 O--(C.sub.2 F.sub.4 O).sub.m (CF.sub.2 O).sub.n --CF.sub.2 ]-Band the free acids thereof, in which the oxyperfluoroalkylene units --C.sub.2 F.sub.4 O--and --CF.sub.2 O-- are randomly distributed along the chain; m and n are integers the sum of which is a number from 2 to 50, and preferably from 4 to 20; the m/n ratio is between 0.2 and 1.5; A is a monovalent radical --CH.sub.2 O--R--SO.sub.3 M, wherein R is a divalent radical in alpha-gamma or alpha-delta position and is selected from the group consisting of alkylene, cycloalkylene, arylene and benzylene radicals, optionally containing, as substituents, chlorine atoms or alkylene or alkoxy groups; and M is an alkali metal, hydrogen or an ammonium group; and B is the same as A or is the radical --CH.sub.2 OH. These products are prepared by reacting .alpha.,.omega.-bis(hydroxymethyl)polyoxaperfluoroalkanes having the formulaHO-CH.sub.2 -[CF.sub.2 O-(C.sub.2 F.sub.4 O).sub.m (CF.sub.2 O).sub.n -CF.sub.2 ]-CH.sub.2 OH,or the alkali or ammonium dialcoholates thereof, with a sultone of the formula ##STR1## wherein R is a divalent radical in alpha-gamma or alpha-delta position and is selected from the group consisting of alkylene, cycloalkylene, arylene and benzylene radicals.