发明授权
- 专利标题: High registration photomask method and apparatus
- 专利标题(中): 高注册光掩模法和设备
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申请号: US752751申请日: 1976-12-20
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公开(公告)号: US4120583A公开(公告)日: 1978-10-17
- 发明人: Gilbert P. Hyatt
- 申请人: Gilbert P. Hyatt
- 专利权人: Hyatt Gilbert P
- 当前专利权人: Hyatt Gilbert P
- 主分类号: B60R16/02
- IPC分类号: B60R16/02 ; B60R16/037 ; F21V23/00 ; G01S7/52 ; G01S15/89 ; G02F1/133 ; G03B27/04 ; G03B27/52 ; G03F9/00 ; G04G99/00 ; G05B19/35 ; G05B19/408 ; G05B19/409 ; G05B19/4093 ; G05B19/414 ; G06J1/00 ; G07G1/12 ; G10L19/00 ; G11C11/56 ; G11C19/28 ; G11C19/36 ; G11C27/00 ; G11C27/04
摘要:
A machine and a control system are provided for generating high registration photomasks with a contact printing arrangement. Further, a unique control arrangement is provided for controlling a machine such as a high registration contact print machine or other type of machine. In a preferred embodiment, a control system generates signals to a step and repeat contact printing machine that exposes many prints of master die images on a photographic film, where these prints have a high registration characteristic. In a further embodiment a unique control arrangement is provided for machine control operations.
公开/授权文献
- US5145113A Ultrasonic generation of a submicron aerosol mist 公开/授权日:1992-09-08
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