发明授权
- 专利标题: Sensitizers for photopolymerization
- 专利标题(中): 用于光聚合的敏化剂
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申请号: US108277申请日: 1979-12-28
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公开(公告)号: US4308400A公开(公告)日: 1981-12-29
- 发明人: Louis Felder , Rudolf Kirchmayr , Rinaldo Husler
- 申请人: Louis Felder , Rudolf Kirchmayr , Rinaldo Husler
- 申请人地址: CHX Basel
- 专利权人: Ciba-Geigy A.G.
- 当前专利权人: Ciba-Geigy A.G.
- 当前专利权人地址: CHX Basel
- 优先权: CHX15884/77 19771222; CHX2518/78 19780308; CHX9723/78 19780918
- 主分类号: C07C323/31
- IPC分类号: C07C323/31 ; C03C17/32 ; C07C45/00 ; C07C49/213 ; C07C49/747 ; C07C49/76 ; C07C49/82 ; C07C49/83 ; C07C49/84 ; C07C67/00 ; C07C213/00 ; C07C225/16 ; C07C225/20 ; C07C323/32 ; C07D295/10 ; C07D295/108 ; C07D303/32 ; C07D333/22 ; C08F2/00 ; C08F2/50 ; C08K5/04 ; C08K5/07 ; C08L7/00 ; C08L21/00 ; C08L23/00 ; C08L33/00 ; C08L33/02 ; C08L67/00 ; C08L77/00 ; C08L101/00 ; C09D4/00 ; C09D5/00 ; C09D11/00 ; C09D11/10 ; C09D123/00 ; G03C1/73 ; G03F7/028 ; G03F7/031 ; C07C49/237
摘要:
Aromatic-aliphatic ketones of the formulae I, II, III or IV ##STR1## wherein n is 1 or 2, Ar is an aryl radical, R.sup.1 and R.sup.2 are monvalent aliphatic, cycloaliphatic or araliphatic radicals, R.sup.3 is a direct bond or a divalent organic radical, X is a hydroxyl or amino group or the monovalent etherification or silylation products thereof, and X' is a divalent amino, ether or silyloxy group, Y is a direct bond or CH.sub.2 and Z is O, S, SO.sub.2, CH.sub.2 or C(CH.sub.3).sub.2, are suitable sensitizers for the photopolymerization of unsaturated compounds and for the photochemical crosslinking of polyolefins. Some of these compounds are novel and can be obtained by methods analogous to those for obtaining the known compounds of this type.
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