发明授权
US4321118A Bis benzoyl sensitizers for photopolymerization or photo cross linking
process and composition
失效
用于光聚合的双苯甲酰敏化剂或光交联方法和组合物
- 专利标题: Bis benzoyl sensitizers for photopolymerization or photo cross linking process and composition
- 专利标题(中): 用于光聚合的双苯甲酰敏化剂或光交联方法和组合物
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申请号: US105744申请日: 1979-12-19
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公开(公告)号: US4321118A公开(公告)日: 1982-03-23
- 发明人: Louis Felder , Rudolf Kirchmayr , Rinaldo Husler
- 申请人: Louis Felder , Rudolf Kirchmayr , Rinaldo Husler
- 申请人地址: NY Ardsley
- 专利权人: Ciba-Geigy Corporation
- 当前专利权人: Ciba-Geigy Corporation
- 当前专利权人地址: NY Ardsley
- 优先权: CHX15884/77 19771222; CHX2518/78 19780308; CHX9723/78 19780918
- 主分类号: C07C323/31
- IPC分类号: C07C323/31 ; C03C17/32 ; C07C45/00 ; C07C49/213 ; C07C49/747 ; C07C49/76 ; C07C49/82 ; C07C49/83 ; C07C49/84 ; C07C67/00 ; C07C213/00 ; C07C225/16 ; C07C225/20 ; C07C323/32 ; C07D295/10 ; C07D295/108 ; C07D303/32 ; C07D333/22 ; C08F2/00 ; C08F2/50 ; C08K5/04 ; C08K5/07 ; C08L7/00 ; C08L21/00 ; C08L23/00 ; C08L33/00 ; C08L33/02 ; C08L67/00 ; C08L77/00 ; C08L101/00 ; C09D4/00 ; C09D5/00 ; C09D11/00 ; C09D11/10 ; C09D123/00 ; G03C1/73 ; G03F7/028 ; G03F7/031 ; C08J3/28
摘要:
Aromatic-aliphatic ketones of the formulae I, II, III or IV ##STR1## wherein n is 1 or 2, Ar is an aryl radical, R.sup.1 and R.sup.2 are monovalent aliphatic, cycloaliphatic or araliphatic radicals, R.sup.3 is a direct bond or a divalent organic radical, X is a hydroxyl or amino group or the monovalent etherification or silylation products thereof, and X' is a divalent amino, ether or silyloxy group, Y is a direct bond or CH.sub.2 and Z is O, S, SO.sub.2, CH.sub.2 or C(CH.sub.3).sub.2, are suitable sensitizers for the photopolymerization of unsaturated compounds and for the photochemical crosslinking of polyolefins. Some of these compounds are novel and can be obtained by methods analogous to those for obtaining the known compounds of this type.
公开/授权文献
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