发明授权
- 专利标题: Heat-treating method for semiconductor components
- 专利标题(中): 半导体元件的热处理方法
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申请号: US225564申请日: 1981-01-16
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公开(公告)号: US4370158A公开(公告)日: 1983-01-25
- 发明人: Karl A. Schulke
- 申请人: Karl A. Schulke
- 申请人地址: DEX Hanau
- 专利权人: Heraeus Quarzschmelze GmbH
- 当前专利权人: Heraeus Quarzschmelze GmbH
- 当前专利权人地址: DEX Hanau
- 优先权: DEX2843261 19781004
- 主分类号: H01L21/205
- IPC分类号: H01L21/205 ; C30B31/10 ; C30B31/18 ; H01L21/22 ; H01L21/324 ; C03B32/00
摘要:
An improved method for the heat treatment of quartz-glass tubes at temperatures above 1200.degree. C. is disclosed wherein a pressure is maintained within the glass tube which is 3 to 110 mm Hg higher than the pressure on the external surface of the quartz tube over the heated area of the tube for at least the length of time that a temperature of 1200.degree. C. is exceeded. The process is particularly useful for the treatment of quartz-glass tubes within which silicon wafers are disposed for the purpose of diffusing doping agent into silicon wafers or of depositing doped epitaxial layers on silicon wafers.
公开/授权文献
- US5515981A Clothes hanger organizer 公开/授权日:1996-05-14