发明授权
- 专利标题: Nonvolatile MNOS semiconductor memory
- 专利标题(中): 非易失性MNOS半导体存储器
-
申请号: US193124申请日: 1980-10-02
-
公开(公告)号: US4460980A公开(公告)日: 1984-07-17
- 发明人: Takaaki Hagiwara , Yokichi Itoh , Ryuji Kondo , Yuji Yatsuda , Shinichi Minami
- 申请人: Takaaki Hagiwara , Yokichi Itoh , Ryuji Kondo , Yuji Yatsuda , Shinichi Minami
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX52-123479 19771017
- 主分类号: G11C17/00
- IPC分类号: G11C17/00 ; G11C16/04 ; H01L21/8247 ; H01L27/105 ; H01L29/417 ; H01L29/788 ; H01L29/792 ; G11C11/40 ; H01L27/02 ; H01L29/34 ; H01L29/78
摘要:
A semiconductor nonvolatile memory wherein a unit cell is constructed of a series connection consisting of an MNOS (metal--silicon nitride--silicon dioxide--semiconductor) transistor whose gate electrode is made of polycrystalline silicon and an MOS (metal--silicon dioxide--semiconductor) transistor whose gate electrode is also made of polycrystalline silicon, such unit cells being arrayed in the form of a matrix, and wherein the gate electrode of the MOS transistor is used as a reading word line, the gate electrode of the MNOS transistor is used as a writing word line, and a terminal of either of the MNOS transistor and the MOS transistor connected in series and constituting the unit cell is used as a data line.
公开/授权文献
信息查询