发明授权
- 专利标题: Ion-implanted bubble device
- 专利标题(中): 离子注入气泡装置
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申请号: US468707申请日: 1983-02-22
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公开(公告)号: US4462087A公开(公告)日: 1984-07-24
- 发明人: Yoshio Satoh , Makoto Ohashi , Tsutomu Miyashita , Kazuo Matsuda , Kazunari Komenou
- 申请人: Yoshio Satoh , Makoto Ohashi , Tsutomu Miyashita , Kazuo Matsuda , Kazunari Komenou
- 申请人地址: JPX Kawsaki
- 专利权人: Fujitsu Limited
- 当前专利权人: Fujitsu Limited
- 当前专利权人地址: JPX Kawsaki
- 优先权: JPX57-25995 19820222; JPX57-70204 19820428
- 主分类号: B41J2/25
- IPC分类号: B41J2/25 ; G11C19/08 ; H01F10/24 ; H01F41/28
摘要:
Ion-implanted bubble device comprises a magnetic layer in which bubble propagation paths are formed by ion-implantation. The bubble propagation path has an inside turn including a cusp of which the summit deviates toward a direction of bubble propagation with respect to a cusp center line. Such a bubble propagation path permits the ion-implanted bubble device adopting a folded minor loop organization to be realized.
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