Invention Grant
- Patent Title: Electrochemical treatment of copper for improving its bond strength
- Patent Title (中): 铜的电化学处理提高其结合强度
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Application No.: US575240Application Date: 1984-01-30
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Publication No.: US4515671APublication Date: 1985-05-07
- Inventor: Ned W. Polan , Chung-Yao Chao
- Applicant: Ned W. Polan , Chung-Yao Chao
- Applicant Address: CT New Haven
- Assignee: Olin Corporation
- Current Assignee: Olin Corporation
- Current Assignee Address: CT New Haven
- Main IPC: C25D5/16
- IPC: C25D5/16 ; C25D5/18 ; H05K3/38 ; C25D17/00
Abstract:
A process and apparatus for treating a metal foil to enhance its ability to be bonded to a substrate comprise immersing the metal foil in an electrolytic cell having an electrolyte bath solution containing copper and applying a current having regularly recurring pulses and preferably flowing in only one direction to the cell. The current causes a dendritic layer of copper to be deposited on at least one surface of the metal foil at a first current density and bonded thereto at a second current density. The process and apparatus are particularly suited for treating copper foil.
Public/Granted literature
- US5645752A Thixotropic magnetorheological materials Public/Granted day:1997-07-08
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