发明授权
- 专利标题: Electrochemical treatment of copper for improving its bond strength
- 专利标题(中): 铜的电化学处理提高其结合强度
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申请号: US575240申请日: 1984-01-30
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公开(公告)号: US4515671A公开(公告)日: 1985-05-07
- 发明人: Ned W. Polan , Chung-Yao Chao
- 申请人: Ned W. Polan , Chung-Yao Chao
- 申请人地址: CT New Haven
- 专利权人: Olin Corporation
- 当前专利权人: Olin Corporation
- 当前专利权人地址: CT New Haven
- 主分类号: C25D5/16
- IPC分类号: C25D5/16 ; C25D5/18 ; H05K3/38 ; C25D17/00
摘要:
A process and apparatus for treating a metal foil to enhance its ability to be bonded to a substrate comprise immersing the metal foil in an electrolytic cell having an electrolyte bath solution containing copper and applying a current having regularly recurring pulses and preferably flowing in only one direction to the cell. The current causes a dendritic layer of copper to be deposited on at least one surface of the metal foil at a first current density and bonded thereto at a second current density. The process and apparatus are particularly suited for treating copper foil.
公开/授权文献
- US5645752A Thixotropic magnetorheological materials 公开/授权日:1997-07-08
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