发明授权
- 专利标题： Photosensitive resin composition
- 专利标题（中）： 感光树脂组合物
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申请号： US496591申请日： 1983-05-20
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公开(公告)号： US4530746A公开(公告)日： 1985-07-23
- 发明人: Kazufumi Azuma , Kazuo Nate , Mitsuo Nakatani , Hitoshi Yokono , Takeshi Endo
- 申请人： Kazufumi Azuma , Kazuo Nate , Mitsuo Nakatani , Hitoshi Yokono , Takeshi Endo
- 申请人地址： JPX Tokyo
- 专利权人： Hitachi, Ltd.
- 当前专利权人： Hitachi, Ltd.
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX57-86606 19820524
- 主分类号： C08F24/00
- IPC分类号： C08F24/00 ; C08F2/50 ; C08F290/00 ; C08F299/00 ; C08F299/02 ; C08G65/00 ; C08G67/00 ; C09D4/00 ; C09D5/00 ; G03F7/027
摘要：
A photosensitive resin composition comprising (a) 10 to 90 parts by weight of at least one polymerizable monomer of the formula: ##STR1## (R is defined in the specification), (b) 90 to 10 parts by weight of at least one compound selected from the group consisting of epoxy-acrylate resins, 1,2-polybutadiene resins, polyester resins and organopolysiloxanes, all having one or more acryloyloxy or methacryloyloxy groups in their molecular end or ends, and (c) 0.05 to 5 parts by weight of a photosensitizer based on 100 parts by weight of the sum of the components (a) and (b) shows slight shrinkage and the resulting coating film is good in adhesive properties and mechanical strength.
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