发明授权
- 专利标题： Rotary substrate holder of molecular beam epitaxy apparatus
- 专利标题（中）： 分子束外延装置的旋转衬底支架
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申请号： US706184申请日： 1985-02-27
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公开(公告)号： US4580522A公开(公告)日： 1986-04-08
- 发明人: Kazumasa Fujioka , Sumio Okuno , Muneo Mizumoto , Hideaki Kamohara , Shinjiro Ueda , Takao Kuroda , Sumio Yamaguchi , Naoyuki Tamura
- 申请人： Kazumasa Fujioka , Sumio Okuno , Muneo Mizumoto , Hideaki Kamohara , Shinjiro Ueda , Takao Kuroda , Sumio Yamaguchi , Naoyuki Tamura
- 申请人地址： JPX Tokyo
- 专利权人： Hitachi, Ltd.
- 当前专利权人： Hitachi, Ltd.
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX59-34209 19840227
- 主分类号： H01L21/203
- IPC分类号： H01L21/203 ; C30B23/06 ; C30B23/08 ; B05C13/00
摘要：
A rotary substrate holder of a molecular beam epitaxy apparatus including leads-cum-posts serving both as leads for passing a current to a heater for heating a substrate and as posts for supporting the heater. By this arrangement, heat transferred from the heater to a bearing disposed in the vicinity of the heater is minimized in amount, thereby prolonging the service life of the holder and minimizing a heat loss thereof.
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