发明授权
- 专利标题： Photochemical process for substrate surface preparation
- 专利标题（中）： 用于底物表面处理的光化学工艺
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申请号： US682406申请日： 1984-12-17
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公开(公告)号： US4590091A公开(公告)日： 1986-05-20
- 发明人: Harvey N. Rogers, Jr. , James T. Hall
- 申请人： Harvey N. Rogers, Jr. , James T. Hall
- 申请人地址： CA Los Angeles
- 专利权人： Hughes Aircraft Company
- 当前专利权人： Hughes Aircraft Company
- 当前专利权人地址： CA Los Angeles
- 主分类号： H01L21/302
- IPC分类号： H01L21/302 ; C23C8/06 ; C23C16/02 ; C23C16/40 ; H01L21/306 ; H01L21/311 ; H01L21/465 ; H01L21/4757 ; B05D3/06 ; B05D5/12
摘要：
A substrate having an undesired native oxide layer formed on the surface thereof is treated at a low temperature by exposure to a chosen vapor phase hydrogen-containing precursor in the presence of radiation of a selected wavelength. Upon radiation-inducement, neutral hydrogen species are formed from the precursor and interact with the native oxide to convert the native oxide to a chemically reduced form. By this process, thermal damage and charge damage to the substrate are avoided and the electrical properties of a subsequently formed device are enhanced.
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