发明授权
US4774413A Ion emmissive head and ion beam irradiation device incorporating the same
失效
并入其的离子发射头和离子束照射装置
- 专利标题: Ion emmissive head and ion beam irradiation device incorporating the same
- 专利标题(中): 并入其的离子发射头和离子束照射装置
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申请号: US919409申请日: 1986-10-16
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公开(公告)号: US4774413A公开(公告)日: 1988-09-27
- 发明人: Masao Okubo , Kiyoshi Sugaya , Toshinori Takagi , Junzo Ishikawa
- 申请人: Masao Okubo , Kiyoshi Sugaya , Toshinori Takagi , Junzo Ishikawa
- 申请人地址: JPX Amagasaki JPX Kyoto JPX Kyoto
- 专利权人: Nihon Denshizairyo Kabushiki Kaisha,Takagi; Toshinori,Ishikawa; Junzo
- 当前专利权人: Nihon Denshizairyo Kabushiki Kaisha,Takagi; Toshinori,Ishikawa; Junzo
- 当前专利权人地址: JPX Amagasaki JPX Kyoto JPX Kyoto
- 优先权: JPX60-238147 19861023
- 主分类号: H05H1/22
- IPC分类号: H05H1/22 ; H01J27/26 ; H01J37/08 ; H01J27/02
摘要:
An ion emmisive head for fusing a metal to emit ion beam is disclosed, wherein a fused metal is designed to infiltrate through a porous portion for flow control and to reach an extremely sharpened needle which is provided after infiltration and wherefrom the fused metal is converted to ion beam by electrical action. Thus, ionized metallic beam is rendered to have smaller width or more focused ray. Submicron technology used in the IC industry, for instance, desires far thinner, finer beam line to attain more compact circuits, which need will be responded in the present invention by disposing a tipping needle to extend out of a porous tip portion which receives the fused metal from melting zone. Appropriate combination of sharpness at the needle point and provision of a beam guiding electrode in neighborhood of an emitting needle point enable to produce about 0.1 micron beam width by prevention of plasma ball which will otherwise diffuse the emitted beam.
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