发明授权
- 专利标题： Method for forming a pattern of a film on a substrate with a laser beam
- 专利标题（中）： 用激光束在基板上形成膜图案的方法
-
申请号： US082545申请日： 1987-08-07
-
公开(公告)号： US4786358A公开(公告)日： 1988-11-22
- 发明人: Shunpei Yamazaki , Akira Mase , Hiroyuki Sakayori
- 申请人： Shunpei Yamazaki , Akira Mase , Hiroyuki Sakayori
- 申请人地址： JPX Atsugi
- 专利权人： Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人： Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人地址： JPX Atsugi
- 优先权： JPX61-186200 19860808; JPX61-186199 19860808; JPX61-186202 19860808
- 主分类号： B23K26/06
- IPC分类号： B23K26/06 ; G02F1/1343 ; G03F7/20 ; H01L21/48 ; H05K3/02 ; B44C1/22 ; C03C15/00 ; C03C25/06 ; C23F1/02
摘要：
An improved method for forming a pattern on a substrate coated with a film is shown. The substrate is irradiated with a laser beam which is shaped through a mask, and a portion of the film is removed by the energy of the laser beam to produce the desired pattern. The laser beam is emitted from an exmer laser.
公开/授权文献
信息查询
IPC分类:
