发明授权
- 专利标题： Phototreating method and apparatus therefor
- 专利标题（中）： 摄影方法及其设备
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申请号： US180687申请日： 1988-04-08
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公开(公告)号： US4844774A公开(公告)日： 1989-07-04
- 发明人: Makoto Sekine , Haruo Okano , Yasuhiro Horiike
- 申请人： Makoto Sekine , Haruo Okano , Yasuhiro Horiike
- 申请人地址： JPX Kawasaki
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： JPX Kawasaki
- 优先权： JPX60-120263 19850603
- 主分类号： H01L21/205
- IPC分类号： H01L21/205 ; C23C16/48 ; C23F4/00 ; H01L21/302 ; H01L21/3065 ; H01L21/311 ; H01L21/312 ; H01L21/3213
摘要：
A phototreating method comprises the steps of introducing a photoreactive gas into a chamber housing a workpiece, emitting first light substantially perpendicularly to a surface of the workpiece, and emitting second light substantially perpendicularly to the surface of the workpiece simultaneously with or after radiation of the first light. The surface of the workpiece is treated utilizing a photochemical reaction of the photoreactive gas caused by radiation of the first light and/or the second light.
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