发明授权
- 专利标题: Semiconductor thin films
- 专利标题(中): 半导体薄膜
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申请号: US70599申请日: 1987-07-09
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公开(公告)号: US4853076A公开(公告)日: 1989-08-01
- 发明人: Bor-Yeu Tsaur , John C. C. Fan , Michael W. Geis
- 申请人: Bor-Yeu Tsaur , John C. C. Fan , Michael W. Geis
- 申请人地址: MA Cambridge
- 专利权人: Massachusetts Institute of Technology
- 当前专利权人: Massachusetts Institute of Technology
- 当前专利权人地址: MA Cambridge
- 主分类号: C30B13/00
- IPC分类号: C30B13/00 ; C30B23/02 ; C30B25/02 ; C30B33/00 ; H01L21/20
摘要:
An improved method and apparatus for optimizing the electrical properties while crystallizing material is disclosed. In this invention, a material which is to be crystallized is formed on a substrate and subjected to a heat treatment to intentionally induce thermal stress while crystallizing the material. The heat treatment melts the material being crystallized and when the material solidifies, a built-in stress is retained which, in the case of n-doped Si on fused silica results in a tensile stress which produces an electron mobility in the film of 870 cm.sup.2 /volt-sec as compared to similarly fashioned unstressed n-doped Si on SiO.sub.2 coated Si which has an electron mobility of 500 cm.sup.2 /volt-sec.
公开/授权文献
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