发明授权
- 专利标题: Positive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dye
- 专利标题(中): 正色光敏醌二叠氮化合物与碱不溶性染料和碱溶性染料
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申请号: US059556申请日: 1987-06-05
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公开(公告)号: US4882260A公开(公告)日: 1989-11-21
- 发明人: Hidekatsu Kohara , Nobuo Tokutake , Masanori Miyabe , Toshimasa Nakayama , Shingo Asaumi , Hatsuyuki Tanaka , Yoshiaki Arai
- 申请人: Hidekatsu Kohara , Nobuo Tokutake , Masanori Miyabe , Toshimasa Nakayama , Shingo Asaumi , Hatsuyuki Tanaka , Yoshiaki Arai
- 申请人地址: JPX Lamagawa
- 专利权人: Tokyo Ohka Kogyo Co., Ltd.
- 当前专利权人: Tokyo Ohka Kogyo Co., Ltd.
- 当前专利权人地址: JPX Lamagawa
- 优先权: JPX61-138143 19860616
- 主分类号: G03C1/00
- IPC分类号: G03C1/00 ; C09D161/08 ; G03C1/72 ; G03F7/004 ; G03F7/022 ; G03F7/025 ; G03F7/04 ; G03F7/09 ; H01L21/027 ; H01L21/30
摘要:
The photosensitive composition, which is suitable as a photoresist material in fine patterning works for the manufacture of semiconductor devices, contains, as a photoextinctive agent, a combination of an alkali-insoluble dye and an alkali-soluble dye each having absorptivity of light in the wavelength region from 230 to 500 nm in a specified amount and in a specified ratio between them. By virtue of the formulation of combined dyes, the undesirable phenomenon of halation by the underlying aluminum coating layer on the substrate surface is greatly decreased so that patterned resist layer obtained with the composition is a high-fidelity reproduction of the original pattern even in a submicron range of fineness with good rectangularity of the cross sectional form of the patterned lines.
公开/授权文献
- US5395287A Multi-profile transition element 公开/授权日:1995-03-07