发明授权
- 专利标题: Electronic beam drawing apparatus
- 专利标题(中): 电子束描绘装置
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申请号: US328854申请日: 1989-03-27
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公开(公告)号: US4983864A公开(公告)日: 1991-01-08
- 发明人: Fumio Murai , Shinji Okazaki
- 申请人: Fumio Murai , Shinji Okazaki
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX63-74292 19880330
- 主分类号: H01L21/027
- IPC分类号: H01L21/027 ; H01J37/02 ; H01J37/248
摘要:
An electron beam drawing apparatus having a grounded conductor for a screening operation in the neighborhood of a detection surface of a detector to detect a reflected electrons obtained by irradiating an electron onto a specimen and a secondary electron generated through the electron irradiation. The conductor has openings to pass therethrough the reflected electron and the secondary electron. As a result, the electric charge accumulated on an organic substance fixed onto the front surface of the detector through the electron irradiation is prevented from exerting an influence on the drawing electron beam.
公开/授权文献
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