发明授权
- 专利标题: Solid film growth apparatus
- 专利标题(中): 固体膜生长装置
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申请号: US366185申请日: 1989-06-14
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公开(公告)号: US5025751A公开(公告)日: 1991-06-25
- 发明人: Shinichiro Takatani , Shigeo Goto , Masahiko Kawata , Kenji Hiruma
- 申请人: Shinichiro Takatani , Shigeo Goto , Masahiko Kawata , Kenji Hiruma
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 主分类号: C23C16/44
- IPC分类号: C23C16/44 ; C23C16/455 ; C30B25/02 ; C30B25/14
摘要:
A solid film forming apparatus, e.g., an MO-MBE (Metal-Organic Molecular Beam Epitaxy) apparatus, wherein evacuatable containers isolated from a growth chamber by a switching device and connected to raw material gas introduction pipings are provided between the growth chamber for a solid film, e.g., a compound semiconductor, and raw material gas introduction pipings. Growth of the solid film is controlled by opening and closing the switching device and evacuating the container at least while the switching device is closed during the growth of the solid film. An undesired influence on the growing film due to residual gas in the containers which are not used for growth can be prevented and, hence, interception and introduction of the raw material gas into the growth chamber can be performed with remarkably high controllability, and films of superior abruptness of the interface between films, e.g., the heterojunction of the compound semiconductor, can be obtained.
公开/授权文献
- US5642478A Distributed trace data acquisition system 公开/授权日:1997-06-24
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