发明授权
- 专利标题: Electroplating composition and process
- 专利标题(中): 电镀组成及工艺
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申请号: US471639申请日: 1990-01-29
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公开(公告)号: US5068013A公开(公告)日: 1991-11-26
- 发明人: Roger F. Bernards , Gordon Fischer , Wade Sonnenberg
- 申请人: Roger F. Bernards , Gordon Fischer , Wade Sonnenberg
- 申请人地址: MA Newton
- 专利权人: Shipley Company Inc.
- 当前专利权人: Shipley Company Inc.
- 当前专利权人地址: MA Newton
- 主分类号: C25D3/38
- IPC分类号: C25D3/38 ; H05K3/42
摘要:
A composition for electroplating copper onto a conductive surface comprising a solution soluble copper salt and an acid electrolyte, said copper salt being present in a concentration of from about 1 to 10 grams per liter of solution and said acid being present in a concentration whereby the acid to copper ratio preferably varies between about 30 to 1 and 50 to 1. The composition is especially useful for the plating of walls of cylindrical openings having a ratio of height to diameter of at least 10 to 1 and a length of at least 0.100 inches.
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