发明授权
US5132746A Biaxial-stress barrier shifts in pseudomorphic tunnel devices
失效
PSEUDMORPHIC隧道设备中的双向应力障碍物移位
- 专利标题: Biaxial-stress barrier shifts in pseudomorphic tunnel devices
- 专利标题(中): PSEUDMORPHIC隧道设备中的双向应力障碍物移位
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申请号: US637397申请日: 1991-01-04
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公开(公告)号: US5132746A公开(公告)日: 1992-07-21
- 发明人: Emilio E. Mendez , Theoren P. Smith, III , Jerry M. Woodall
- 申请人: Emilio E. Mendez , Theoren P. Smith, III , Jerry M. Woodall
- 申请人地址: NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: NY Armonk
- 主分类号: H01L29/205
- IPC分类号: H01L29/205 ; H01L29/12 ; H01L29/737 ; H01L29/76 ; H01L29/88 ; H01L31/10
摘要:
Resonant tunneling devices having improved peak-to-valley current ratios are disclosed. The resonant tunneling device comprises a quantum well layer surrounded by first and second barrier layers, the first and second barrier layers being comprised of an indirect first III-V compound semiconductor. The first barrier layer being formed on a substrate of a second III-V compound semiconductor having a lattice constant larger than the lattice constant of the first barrier layer thereby inducing a biaxial stress in the first barrier layer. The biaxial stress results in an energy shift at resonance that increases the peak to valley current ratio of the device.
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