发明授权
US5185523A Mass spectrometer for analyzing ultra trace element using plasma ion
source
失效
用于使用等离子体离子源分析超微量元素的质谱仪
- 专利标题: Mass spectrometer for analyzing ultra trace element using plasma ion source
- 专利标题(中): 用于使用等离子体离子源分析超微量元素的质谱仪
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申请号: US848932申请日: 1992-03-10
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公开(公告)号: US5185523A公开(公告)日: 1993-02-09
- 发明人: Masatoshi Kitagawa , Yukio Okamoto , Takayuki Ono , Tetuya Shinden
- 申请人: Masatoshi Kitagawa , Yukio Okamoto , Takayuki Ono , Tetuya Shinden
- 申请人地址: JPX Tokyo JPX Ibaraki
- 专利权人: Hitachi, Ltd.,Hitachi Instrument Engineering Co., Ltd.
- 当前专利权人: Hitachi, Ltd.,Hitachi Instrument Engineering Co., Ltd.
- 当前专利权人地址: JPX Tokyo JPX Ibaraki
- 优先权: JPX3-46539 19910312
- 主分类号: G01N27/62
- IPC分类号: G01N27/62 ; H01J27/16 ; H01J37/252 ; H01J49/04 ; H01J49/10 ; H01J49/12 ; H01J49/24
摘要:
A mass spectrometer for analyzing ultra trace element using plasma ion source comprising, a plasma generating means for ionizing sampling gas by generating plasma, a vaccum chamber for taking in ions of the sampling gas from a hole of the vacuum chamber, an ion lens and a mass analyzing portion, and an ion detector for detecting the ions which are passed through the ion lens and the mass analyzing portion, wherein further comprising, a moving mechanism for moving said plasma generating means according to a vacuum degree measured in the vacuum chamber so as to make the sensitivity of the mass spectrometer higher.
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