发明授权
US5192393A Method for growing thin film by beam deposition and apparatus for practicing the same 失效
通过光束沉积法生长薄膜的方法及其实施方法

Method for growing thin film by beam deposition and apparatus for
practicing the same
摘要:
A method for growing a thin film on a substrate of metal or ceramics by beam deposition comprising the steps of:(I) producing from starting gases ions of elements or compounds thereof to be deposited on the substrate;(II) irradiating the ions produced in step (I) with electromagneti waves to electronically excite at least one sort of said ions; and(III) impacting an ion beam comprising the ions excited in step (II) onto said substrate to deposit thereon, thereby growing a film, and an apparatus for practicing the method. The method enables the formation of thin films having a higher crystallinity by electronically exciting ions or neutral species to increase the internal energy thereof and then impacting a beam comprising the excited ions or neutral species onto the substrate.
公开/授权文献
信息查询
0/0