发明授权
- 专利标题： Resists with enhanced sensitivity and contrast
- 专利标题（中）： 抵抗增强灵敏度和对比度
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申请号： US754847申请日： 1991-09-04
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公开(公告)号： US5227280A公开(公告)日： 1993-07-13
- 发明人: James A. Jubinsky , Steven M. Katz , Christopher F. Lyons , Wayne M. Moreau
- 申请人： James A. Jubinsky , Steven M. Katz , Christopher F. Lyons , Wayne M. Moreau
- 申请人地址： NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： NY Armonk
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/037 ; G03F7/039 ; G03F7/09 ; G03F7/26 ; H01L21/027 ; H01L21/30
摘要：
A PMGI bilayer resist for integrated circuit fabrication having increased sensitivity to light and formed by the addition of cyclic anhydrides to the resist and the formation of an accompanying bilayer resist structure of a portable conforming mask having a desirable undercut profile for lift-off of patterned metallic circuitry.
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