发明授权
US5252151A Fe-Ni alloy sheet for shadow mask having a low silicon segregation and
method for manufacturing same
失效
具有低硅偏析的荫罩用Fe-Ni合金薄板及其制造方法
- 专利标题： Fe-Ni alloy sheet for shadow mask having a low silicon segregation and method for manufacturing same
- 专利标题（中）： 具有低硅偏析的荫罩用Fe-Ni合金薄板及其制造方法
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申请号： US768918申请日： 1991-10-01
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公开(公告)号： US5252151A公开(公告)日： 1993-10-12
- 发明人: Tadashi Inoue , Masayuki Kinoshita , Tomoyoshi Okita
- 申请人： Tadashi Inoue , Masayuki Kinoshita , Tomoyoshi Okita
- 申请人地址： JPX Tokyo
- 专利权人： NKK Corporation
- 当前专利权人： NKK Corporation
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX2-32414 19900215; JPX2-210242 19900810; JPX2-218945 19900822
- 主分类号： C21D8/02
- IPC分类号： C21D8/02 ; H01J9/14 ; H01J29/07 ; C12D8/00 ; C12D9/46
摘要：
An Fe-Ni alloy sheet for a shadow mask, which consists essentially of:nickel: from 34 to 38 wt. %,silicon: from 0.01 to 0.15 wt. %,manganese: from 0.01 to 1.00 wt. %, andthe balance being iron and incidental impurities.The surface portion of the alloy sheet has a silicon (Si) segregation rate, as expressed by the following formula, of up to 10%: ##EQU1## and a center-line mean roughness (Ra) of the alloy sheet satisfies the following formula:0.3 .mu.m
公开/授权文献
- US5860313A Method of manufacturing press-formed product 公开/授权日：1999-01-19
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