发明授权
US5292626A Developer composition for irradiated, radiation-sensitive
positive-working, negative-working and reversible reprographic layers
失效
用于辐射,辐射敏感的正面工作,负面工作和可逆复制层的显影剂组合物
- 专利标题: Developer composition for irradiated, radiation-sensitive positive-working, negative-working and reversible reprographic layers
- 专利标题(中): 用于辐射,辐射敏感的正面工作,负面工作和可逆复制层的显影剂组合物
-
申请号: US750313申请日: 1991-08-27
-
公开(公告)号: US5292626A公开(公告)日: 1994-03-08
- 发明人: Gerhard Buhr , Andreas Elsaesser , Hans W. Frass , Ernst I. Leupold
- 申请人: Gerhard Buhr , Andreas Elsaesser , Hans W. Frass , Ernst I. Leupold
- 申请人地址: DEX Frankfurt am Main
- 专利权人: Hoechst Aktiengesellschaft
- 当前专利权人: Hoechst Aktiengesellschaft
- 当前专利权人地址: DEX Frankfurt am Main
- 优先权: DEX4027299 19900829
- 主分类号: G03F7/32
- IPC分类号: G03F7/32
摘要:
The present invention relates to a developer composition for radiation-sensitive positive-working and negative-working and reversible reprographic layers which apart from a radiation-sensitive compound or radiation-sensitive combination of compounds contain, as an essential constituent, a binder which is insoluble in water but soluble in aqueous-alkaline solutions, said developer composition being characterized in that it contains, as essential constituents,(a) O- carboxymethyl- or O,O'-biscarboxymethylethylene glycol or an appropriately substituted polyethylene glycol comprising 2 to about 500 ethylene glycol units,(b) at least one compound showing an alkaline reaction in water, selected from the group including alkali metal hydroxides, alkali metal silicates, alkali metal phosphates, alkali metal borates, ammonium hydroxides, ammonium silicates, ammonium phosphates and ammonium borates, and(c) water.The developer composition gives a very good yield, makes possible short developing times and does not cause any problems due to flaky deposits of layer constituents or foaming. A process for developing positive-working, negative-working and reversible reprographic layers with the developer composition is also disclosed.
公开/授权文献
信息查询
IPC分类: