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1.发明授权Developer composition for irradiated, radiation-sensitive positive-working, negative-working and reversible reprographic layers 失效用于辐射，辐射敏感的正面工作，负面工作和可逆复制层的显影剂组合物
公开(公告)号：US5292626A
公开(公告)日：1994-03-08
申请号：US750313
申请日：1991-08-27
IPC分类号： G03F7/32
CPC分类号： G03F7/322
摘要： The present invention relates to a developer composition for radiation-sensitive positive-working and negative-working and reversible reprographic layers which apart from a radiation-sensitive compound or radiation-sensitive combination of compounds contain, as an essential constituent, a binder which is insoluble in water but soluble in aqueous-alkaline solutions, said developer composition being characterized in that it contains, as essential constituents,(a) O- carboxymethyl- or O,O'-biscarboxymethylethylene glycol or an appropriately substituted polyethylene glycol comprising 2 to about 500 ethylene glycol units,(b) at least one compound showing an alkaline reaction in water, selected from the group including alkali metal hydroxides, alkali metal silicates, alkali metal phosphates, alkali metal borates, ammonium hydroxides, ammonium silicates, ammonium phosphates and ammonium borates, and(c) water.The developer composition gives a very good yield, makes possible short developing times and does not cause any problems due to flaky deposits of layer constituents or foaming. A process for developing positive-working, negative-working and reversible reprographic layers with the developer composition is also disclosed.
摘要翻译： 本发明涉及一种用于辐射敏感的阳性作用和负性和可逆复制层的显影剂组合物，除了辐射敏感化合物或化合物的辐射敏感组合之外，其包含作为必需成分的不溶性粘合剂的粘合剂 所述显影剂组合物的特征在于其含有（a）O-羧甲基或O，O-双羧基甲基乙二醇或适当取代的聚乙二醇，其包含2至约500个 乙二醇单元，（b）至少一种在水中显示碱性反应的化合物，其选自碱金属氢氧化物，碱金属硅酸盐，碱金属磷酸盐，碱金属硼酸盐，氢氧化铵，硅酸铵，磷酸铵和硼酸铵 ，（c）水。 显影剂组合物产生非常好的产率，使得可能短的显影时间，并且不会由于层成分的片状沉积或发泡而引起任何问题。 还公开了利用显影剂组合物开发正性，负性和可逆复制层的方法。
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2.发明授权Positive-working 1,2-quinone diazide radiation-sensitive mixture and recording material containing urethane compound to diminish developer solubility 失效正负性1,2-醌二叠氮化合物辐射敏感性混合物和含有氨基甲酸酯化合物的记录材料以降低显影剂溶解度
公开(公告)号：US5368975A
公开(公告)日：1994-11-29
申请号：US39554
申请日：1993-03-26
CPC分类号： G03F7/039 , G03F7/0233
摘要： The invention relates to a usually positive-working radiation-sensitive mixture which contains as essential components a binder which is insoluble in water and soluble in aqueous-alkaline solutions, a 1,2-quinone diazide and a compound which diminishes the developer solubility of the exposed regions by heat treatment, in which the compound which diminishes the developer solubility which is present is at least one urethane of the formula I: ##STR1## in which R.sub.1 is hydrogen or methyl,R.sub.2 is hydrogen, alkyl, substituted or unsubstituted aryl, or substituted or unsubstituted arylaminocarbonyl,R.sub.3 is substituted or unsubstituted arylene or arylenealkylene,Q is hydrogen, --CH.sub.4-p, or --CR.sub.5 R.sub.6 in which R.sub.5 and R.sub.6 can be identical or different and are selected from the group consisting of hydrogen, alkyl and aryl, carbonyl, oxygen, sulfur or sulfonyl,m is 1, 2 or 3,n is at least 1 and not more than 50, andis 1, 2 or 3.The mixture is suitable for producing a radiation-sensitive recording material which has a long shelf life in combination with high radiation sensitivity and has a broad image reversal range in a process for producing relief images.
摘要翻译： 本发明涉及一种通常为正性的辐射敏感性混合物，其包含作为必需组分的粘合剂，其不溶于水并且可溶于水性 - 碱性溶液，1,2-醌二叠氮化物和降低显影剂溶解度的化合物 暴露区域，其中减少存在的显影剂溶解度的化合物是至少一种式I的氨基甲酸酯：其中R 1是氢或甲基，R 2是氢，烷基，取代或未取代的芳基 或者取代或未取代的芳基氨基羰基，R3是取代或未取代的亚芳基或亚芳基亚烷基，Q是氢，-CH4-p或-CR5R6，其中R5和R6可以相同或不同，并且选自氢，烷基和 芳基，羰基，氧，硫或磺酰基，m为1,2或3，n至少为1且不大于50，为1,2或3.该混合物适用于生产辐射敏感记录材料 其具有长的保质期和高的辐射灵敏度，并且在用于产生浮雕图像的过程中具有广泛的图像反转范围。
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3.发明授权Radiation-sensitive mixture, radiation-sensitive recording material produced therewith containing halogenated methyl groups in the polymeric binder 失效辐射敏感性混合物，由此生产的辐射敏感记录材料含有聚合物粘合剂中的卤代甲基
公开(公告)号：US5376496A
公开(公告)日：1994-12-27
申请号：US648143
申请日：1991-01-30
申请人： Andreas Elsaesser , Hans W. Frass , Dieter Mohr
发明人： Andreas Elsaesser , Hans W. Frass , Dieter Mohr
IPC分类号： G03F7/004 , G03F7/023 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0233 , G03F7/0045 , G03F7/039 , Y10S430/108 , Y10S430/115
摘要： A radiation-sensitive mixture, a radiation-sensitive recording material produced from themixture, and a process for producing heat-resistant and chemical-resistant relief copies using the recording material are disclosed. The normally positive-working radiation-sensitive mixture contains(1) a water-insoluble polymeric binder which is soluble in aqueous alkaline solutions, and(2) a 1,2-quinone diazide and/or a combination ofa compound which forms strong acid when exposed to actinic radiation anda compound containing at least one acid-cleavable C--O--C bond.The polymeric binder has a molecular weight of between about 5,000 and 100,000 and a content of phenolic hydroxyl groups of about 1 to 15, preferably about 2 to 10, mmol/g of polymer. It has a content of --CH.sub.3-n X.sub.n units of at least 0.1, preferably about 0.5 to 2, mmol/g of polymer, X being halogen such as chlorine, bromine or iodine and n being 1, 2 or 3. Lithographic plates are produced with the mixture which are thermally postcurable, have a high print run and have good resistance to chemicals. Photoresists having high heat resistance can also be produced with the mixture.
摘要翻译： 公开了一种辐射敏感性混合物，由混合物生产的辐射敏感记录材料，以及使用该记录材料生产耐热和耐化学腐蚀的复制品的方法。 通常正性工作的辐射敏感性混合物包含（1）可溶于碱性水溶液的水不溶性聚合物粘合剂，和（2）1,2-醌二叠氮化物和/或形成强酸的化合物的组合 当暴露于光化辐射和含有至少一个可酸切割的COC键的化合物时。 聚合物粘合剂的分子量为约5,000至100,000，酚羟基的含量为约1至15，优选约2至10mmol / g聚合物。 其具有至少0.1，优选约0.5至2mmol / g聚合物的-CH 3-n X n单元的含量，X为卤素如氯，溴或碘，n为1,2或3.制备平版印刷版 具有热后固化性的混合物具有高的印刷速度，并具有良好的耐化学性。 也可以用混合物制备具有高耐热性的光致抗蚀剂。
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公开(公告)号：US5227281A
公开(公告)日：1993-07-13
申请号：US625542
申请日：1990-12-11
CPC分类号： G03F7/38 , G03F7/2022
摘要： A process for producing negative copies is disclosed in which a light-sensitive or radiation-sensitive recording material comprising a layer support and a normally positive-working light-sensitive or radiation-sensitive layer applied thereto is irradiated imagewise, thermally treated, irradiated overall and then developed with an alkaline developer. Thermal treatment is carried out with water or with an aqueous solution, at temperatures in the range from about 50.degree. to 100.degree. C., preferably from 60.degree. to 90.degree. C., within a period of time varying between about 1 second and 5 minutes, preferably between 5 seconds and 1 minute, overall irradiation is performed on the optionally still hot recording material and development is thereafter carried out within a period of time varying between about 10 seconds and 2 minutes, preferably between 15 seconds and 1 minute. The process can be carried out according to the customary procedure known in the practice of positive processing, and results in perfect printing stencils.
摘要翻译： 公开了一种用于制造负片的方法，其中对包含层支撑体和施加于其上的正常正光敏感或辐射敏感层的感光或辐射敏感记录材料进行成像照射，热处理，整体辐射照射 然后用碱性显影剂显影。 热处理在水中或水溶液中进行，温度范围为约50℃至100℃，优选60℃至90℃，时间间隔约1秒至5秒 分钟，优选在5秒至1分钟之间，对任意热的记录材料进行总体照射，然后在约10秒至2分钟之间，优选15秒至1分钟之间的时间内进行显影。 该过程可以根据正面加工实践中已知的常规程序进行，并产生完美的印刷模版。
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5.发明授权Radiation-sensitive recording material with a positive-working, radiation-sensitive layer having a rough surface containing a surfactant having polysiloxane units 失效具有正性辐射敏感层的辐射敏感记录材料，其具有包含具有聚硅氧烷单元的表面活性剂的粗糙表面
公开(公告)号：US5378584A
公开(公告)日：1995-01-03
申请号：US924750
申请日：1992-08-04
申请人： Hans W. Frass , Ernst-August Hackmann , Klaus Joerg , Dietmar Koenneke , Rudolf Neubauer , Andreas Elsaesser
发明人： Hans W. Frass , Ernst-August Hackmann , Klaus Joerg , Dietmar Koenneke , Rudolf Neubauer , Andreas Elsaesser
CPC分类号： G03F7/004 , G03F7/0226 , G03F7/115
摘要： A radiation-sensitive recording material, in particular for producing planographic printing plates, is disclosed. The material is composed of a layer support and a positive-working, radiation-sensitive layer having a rough surface containing at least one 1,2-quinonediazide as a radiation-sensitive compound, a polycondensate or polymer as a binder insoluble in water and soluble or swellable in aqueous-alkaline solutions, a dye and a filler. At a layer weight of 3 g/m.sup.2 or less, the radiation-sensitive layer comprises a silicic acid product having a mean grain size in the range from 3 to 5 .mu.m with an exclusion limit of 15 .mu.m as a filler in such a quantity that it exhibits a Bekk smoothness in the range from 20 to 100 seconds (determined according to DIN 53 107, Method A). The layer additionally comprises a surfactant having polysiloxane units. The recording material shows good copying properties and technical printing properties, such as an advantageous evacuation time, screen evenness, low susceptibility to air occlusions, good resolving power and a good coating structure. The invention also relates to a process for producing a planographic printing plated, using the recording material according to the invention.
摘要翻译： 公开了一种辐射敏感记录材料，特别是用于生产平版印刷版的材料。 该材料由具有粗糙表面的层载体和正性辐射敏感层组成，其具有至少一种作为辐射敏感性化合物的1,2-醌二叠氮化物，作为不溶于水和可溶性的粘合剂的缩聚物或聚合物 或在水性碱性溶液中溶胀，染料和填料。 在3g / m 2以下的层重量下，辐射敏感层包含平均粒度在3〜5μm的硅酸产品，排阻极限为15μm作为填料， 其表现为Bekk平滑度在20至100秒的范围内（根据DIN 53 107，方法A确定）。 该层还包含具有聚硅氧烷单元的表面活性剂。 记录材料具有良好的复印性能和技术打印性能，例如有利的抽真空时间，屏幕均匀性，对空气阻塞的低敏感性，良好的分辨能力和良好的涂层结构。 本发明还涉及使用根据本发明的记录材料来生产平版印刷电镀的方法。
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6.发明授权Process for the production of negative relief copies utilizing reversal processing 失效使用反转处理生产负面浮雕副本的过程
公开(公告)号：US4990429A
公开(公告)日：1991-02-05
申请号：US423251
申请日：1989-10-18
申请人： Paul Stahlhofen , Hans W. Frass
发明人： Paul Stahlhofen , Hans W. Frass
CPC分类号： G03F7/0045 , G03F7/0226
摘要： The invention describes a photosensitive composition, a copying material prepared from this composition, and a process for the production of negative relief copies, in which a photosensitive composition or a photosensitive material, respectively, is used, that comprises a support and a photosensitive composition coated onto the support and comprising a photosensitive 1,2-quinonediazide or a photosensitive mixture, a binder that is soluble in aqueous-alkaline solutions and an s-triazine of the general formula I ##STR1## wherein R denotes akyl, allyl, alkoxy, alkoxycarbonyl, alkoxycarbonylakkenyl, each having from 1 to 4 carbon atoms in the alkyl or alkenyl group, aryloxy, halogen or a nitro group andn stands for 1 to 3.The material is exposed imagewise under a negative original, thereafter heated and, after cooling, exposed without an original or optionally under a positive original, then developed by means of an aqueous-alkaline developer and optionally baked.The copying material has a relatively large treatment range during the heating step and can be used for the production of negative and positive printing forms and in the photocomposing process.
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7.发明授权Photosensitive composition, photosensitive copying material prepared from this composition with thermal hardening symmetric triazine alkyl(aryl)-ether 失效光敏组合物，由该组合物由热硬化对称三嗪烷基（芳基） - 醚制备的感光复印材料
公开(公告)号：US4889788A
公开(公告)日：1989-12-26
申请号：US224725
申请日：1988-07-27
申请人： Paul Stahlhofen , Hans W. Frass
发明人： Paul Stahlhofen , Hans W. Frass
CPC分类号： G03F7/0045 , G03F7/0226
摘要： The invention describes a photosensitive composition, a copying material prepared from this composition, and a process for the production of negative relief copies, in which a photosensitive composition or a photosensitive material, respectively, is used, that comprises a support and a photosensitive composition coated onto the suppoort and comprising a photosensitive 1,2-quinonediazide or a photosensitive mixture, a binder that is soluble in aqueous-alkaline solutions and an s-triazine of the general formula I ##STR1## wherein R denotes akyl, allyl, alkoxy, alkoxycarbonyl, alkoxycarbonylakkenyl, each having from 1 to 4 carbon atoms in the alkyl or alkenyl group, aryloxy, halogen or a nitro group andn stands for 1 to 3. The material is exposed imagewise under a negative original, thereafter heated and, after cooling, exposed without an original or optionally under a positive original, then developed by means of an aqueous-alkaline developer and optionally baked. The copying material has a relatively large treatment range during the heating step and can be used for the production of negative and positive printing forms and in the photocomposing process.
摘要翻译： 本发明描述了一种光敏组合物，由该组合物制备的复印材料，以及用于制备其中分别使用感光组合物或感光材料的负凸版印刷品的方法，其包括载体和涂覆的感光组合物 包括感光性1,2-醌二叠氮化物或感光性混合物，可溶于水性 - 碱性溶液的粘合剂和通式I（I）的s-三嗪，其中R表示烷基，烯丙基， 烷氧基，烷氧基羰基，烷氧基羰基烷基，烷基或链烯基中具有1至4个碳原子的烷氧羰基烷基，芳氧基，卤素或硝基，n表示1至3.该材料在阴性原件下成像曝光， 冷却后，没有原件或任选地在正极原料下暴露，然后通过水性 - 碱性显影剂显影并任选地烘烤。 复印材料在加热步骤中具有相对较大的处理范围，并且可以用于生产负面和正面印刷形式以及在光电曝光过程中。
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